Chalcogenide MOCVD (MOCVD 1)

    Equipment/facility: Equipment

      Equipments Details

      Description

      The 2DCC Chalcogenide metal organic chemical vapor deposition (MOCVD) system is an upgraded III-V MOCVD system that was successfully converted in March 2017 to grow chalcogenides. The system is a cold wall reactor design that is capable of handling up to two-inch diameter substrates. MOCVD 1 possesses six bubbles for liquid/solid sources and four gas source lines. Loading and unloading of samples is done in a controlled atmosphere though an integrated glove box. Real-time gas analysis allows for process control, as well as, information for fundamental growth dynamics studies.

      Capabilities:
      Cold wall reactor for 2” diameter substrates
      Toxic gas monitoring by integrated gas detection/exhaust and scrubber/safety system
      Real time gas analysis via RGA and sampling system
      Controlled atmosphere sample loading/unloading
      6 bubblers for liquid/solid sources and 4 gas source lines (H2Se, H2S)
      Dual wavelength fiber optic pyrometer for sensing substrate temperature

      Current Process Capabilities:
      WS2, WSe2, MoS2, MoSe2, NbS2, NbSe2, including various doped, alloys and heterostructures of these materials

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