193-nm Lithography

Mordechai Rothschild, Anthony R. Forte, Mark W. Horn, Roderick R. Kunz, Susan C. Palmateer, Jan H.C. Sedlacek

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The trend in microelectronics toward printing features 0.25 μm and below has motivated the development of lithography at the 193-nm wavelength of argon fluoride excimer lasers. This technology is in its early stages, but a picture is emerging of its strengths and limitations. The change in wavelength from 248 to 193 nm will require parallel progress in projection systems, optical materials, and photo-resist chemistries and processes. This paper reviews the current status of these various topics as they have been engineered under a multiyear program at MIT Lincoln Laboratory.

Original languageEnglish (US)
Pages (from-to)916-923
Number of pages8
JournalIEEE Journal of Selected Topics in Quantum Electronics
Volume1
Issue number3
DOIs
StatePublished - Sep 1995

Fingerprint

Lithography
lithography
Projection systems
Wavelength
Optical materials
Excimer lasers
optical materials
microelectronics
Microelectronics
wavelengths
printing
excimer lasers
fluorides
Printing
Argon
emerging
projection
argon
chemistry
trends

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Rothschild, M., Forte, A. R., Horn, M. W., Kunz, R. R., Palmateer, S. C., & Sedlacek, J. H. C. (1995). 193-nm Lithography. IEEE Journal of Selected Topics in Quantum Electronics, 1(3), 916-923. https://doi.org/10.1109/2944.473679
Rothschild, Mordechai ; Forte, Anthony R. ; Horn, Mark W. ; Kunz, Roderick R. ; Palmateer, Susan C. ; Sedlacek, Jan H.C. / 193-nm Lithography. In: IEEE Journal of Selected Topics in Quantum Electronics. 1995 ; Vol. 1, No. 3. pp. 916-923.
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Rothschild, M, Forte, AR, Horn, MW, Kunz, RR, Palmateer, SC & Sedlacek, JHC 1995, '193-nm Lithography', IEEE Journal of Selected Topics in Quantum Electronics, vol. 1, no. 3, pp. 916-923. https://doi.org/10.1109/2944.473679

193-nm Lithography. / Rothschild, Mordechai; Forte, Anthony R.; Horn, Mark W.; Kunz, Roderick R.; Palmateer, Susan C.; Sedlacek, Jan H.C.

In: IEEE Journal of Selected Topics in Quantum Electronics, Vol. 1, No. 3, 09.1995, p. 916-923.

Research output: Contribution to journalArticle

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Rothschild M, Forte AR, Horn MW, Kunz RR, Palmateer SC, Sedlacek JHC. 193-nm Lithography. IEEE Journal of Selected Topics in Quantum Electronics. 1995 Sep;1(3):916-923. https://doi.org/10.1109/2944.473679