193 nm resists and lithography

Roderick R. Kunz, Robert D. Allen, Mark A. Hartney, William D. Hinsberg, Mark W. Horn, Craig L. Keast, Mordechai Rothschild, David C. Shaver, Gregory M. Wallraff

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A review of recent efforts to develop photoresist materials and processes for 193 nm (ArF excimer laser) photolithography is reported. Three categories of resist processes are discussed: (1) conventional single layer, (2) bilayer and (3) surface‐imaged resist processes. To date, materials have been developed for each process which exhibit resolution to less than 0.25 μm with sensitivities of less than 50 mJ/cm2.

Original languageEnglish (US)
Pages (from-to)12-21
Number of pages10
JournalPolymers for Advanced Technologies
Volume5
Issue number1
DOIs
StatePublished - Jan 1994

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Lithography
Excimer lasers
Photolithography
Photoresists

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics

Cite this

Kunz, R. R., Allen, R. D., Hartney, M. A., Hinsberg, W. D., Horn, M. W., Keast, C. L., ... Wallraff, G. M. (1994). 193 nm resists and lithography. Polymers for Advanced Technologies, 5(1), 12-21. https://doi.org/10.1002/pat.1994.220050103
Kunz, Roderick R. ; Allen, Robert D. ; Hartney, Mark A. ; Hinsberg, William D. ; Horn, Mark W. ; Keast, Craig L. ; Rothschild, Mordechai ; Shaver, David C. ; Wallraff, Gregory M. / 193 nm resists and lithography. In: Polymers for Advanced Technologies. 1994 ; Vol. 5, No. 1. pp. 12-21.
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Kunz, RR, Allen, RD, Hartney, MA, Hinsberg, WD, Horn, MW, Keast, CL, Rothschild, M, Shaver, DC & Wallraff, GM 1994, '193 nm resists and lithography', Polymers for Advanced Technologies, vol. 5, no. 1, pp. 12-21. https://doi.org/10.1002/pat.1994.220050103

193 nm resists and lithography. / Kunz, Roderick R.; Allen, Robert D.; Hartney, Mark A.; Hinsberg, William D.; Horn, Mark W.; Keast, Craig L.; Rothschild, Mordechai; Shaver, David C.; Wallraff, Gregory M.

In: Polymers for Advanced Technologies, Vol. 5, No. 1, 01.1994, p. 12-21.

Research output: Contribution to journalArticle

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Kunz RR, Allen RD, Hartney MA, Hinsberg WD, Horn MW, Keast CL et al. 193 nm resists and lithography. Polymers for Advanced Technologies. 1994 Jan;5(1):12-21. https://doi.org/10.1002/pat.1994.220050103