A Finite Energy Bandwidth-Based Diffraction Simulation Framework for Thermal Processing Applications

Darren C. Pagan, Kevontrez K. Jones, Joel V. Bernier, Thien Q. Phan

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

We present a novel finite energy bandwidth-based diffraction simulation framework to aid the analysis of x-ray diffraction patterns gathered during in situ advanced manufacturing processes. The framework generates two-dimensional diffraction patterns that simulate the effects of x-ray energy distributions typical of monochromating optics, and uses microstructure and temperature fields from thermal processing simulations as input.As a demonstration of the capabilities of the framework, we model diffraction associated with selective laser melting of the nickel-based superalloy Inconel 625, employing a finite element thermal model for the input. The simulated diffraction patterns correspond to material volumes exhibiting large temperature gradients consistent with complex thermal processing environments, and we illustrate their utility for interpreting in situ data.

Original languageEnglish (US)
Pages (from-to)4539-4550
Number of pages12
JournalJOM
Volume72
Issue number12
DOIs
StatePublished - Dec 2020

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)

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