The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.
All Science Journal Classification (ASJC) codes
- Nuclear and High Energy Physics
- Materials Science(all)
- Nuclear Energy and Engineering