A method for the mass production of ICF targets

K. D. Wise, T. N. Jackson, N. A. Masnari, M. G. Robinson, D. E. Solomon, G. H. Wuttke, W. B. Rensel

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Abstract

The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

Original languageEnglish (US)
Pages (from-to)103-106
Number of pages4
JournalJournal of Nuclear Materials
Volume85-86
Issue numberPART 1
DOIs
StatePublished - Dec 2 1979

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All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

Cite this

Wise, K. D., Jackson, T. N., Masnari, N. A., Robinson, M. G., Solomon, D. E., Wuttke, G. H., & Rensel, W. B. (1979). A method for the mass production of ICF targets. Journal of Nuclear Materials, 85-86(PART 1), 103-106. https://doi.org/10.1016/0022-3115(79)90475-6