A method for the mass production of ICF targets

K. D. Wise, T. N. Jackson, N. A. Masnari, M. G. Robinson, D. E. Solomon, G. H. Wuttke, W. B. Rensel

Research output: Contribution to journalArticlepeer-review

4 Scopus citations


The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

Original languageEnglish (US)
Pages (from-to)103-106
Number of pages4
JournalJournal of Nuclear Materials
Issue numberPART 1
StatePublished - Dec 2 1979

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering


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