A new method for measuring thermal conductivity of thin films

S. Govorkov, W. Ruderman, M. W. Horn, R. B. Goodman, M. Rothschild

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

A new, relatively inexpensive, easy-to-use instrument has been developed for measuring the thermal conductivity of thin films based on a differential photoacoustic method. Measurements made on silicon dioxide and silicon nitride are consistent with those reported previously for a different technique. In addition, the room temperature thermal conductivity of conventional polymer thin films and plasma deposited thin films has been determined relative to thermally grown silicon dioxide. Knowledge of the thermal conductivity of thin films, which is critical for many applications, can now be obtained for any thin film which can be deposited on a high thermal conductivity substrate.

Original languageEnglish (US)
Pages (from-to)3828-3834
Number of pages7
JournalReview of Scientific Instruments
Volume68
Issue number10
DOIs
StatePublished - Oct 1997

All Science Journal Classification (ASJC) codes

  • Instrumentation

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