A reaction model for plasma coating of nanoparticles in hydrocarbon plasma

Alexander L. Yarin, Beniamino Rovagnati, Farzad Mashayek, Themis Matsoukas

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A detailed chemical kinetics scheme of the reactions occurring in a CH4/H2 plasma is used to model the deposition of amorphous carbon films onto submicron particle suspended in the plasma. The model includes electron-neutral, ion-neutral, and neutral-neutral reactions and solves for the radial distribution of species in the vicinity of the particle. Concentration profiles are obtained by solving simultaneously the diffusion equation for all species that deposit on the particle surface, and the Poisson equation for the charge-carrying species. To accommodate the low-pressure environment, the continuum equations are solved to within one mean-free path from the particle surface while kinetic theory is used to treat phenomena inside the vacuum sphere, i.e., at distances shorter than one mean-free path. Calculations at various plasma conditions and the results observed trends in light of available experimental data are presented. This is an abstract of a paper presented at the AIChE Annual Meeting and Fall Showcase (Cincinnati, OH 10/30/2005-11/4/2005).

Original languageEnglish (US)
Title of host publication05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings
PublisherAmerican Institute of Chemical Engineers
Volume2005
ISBN (Print)0816909962, 9780816909964
StatePublished - 2005
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
CountryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

Fingerprint

Hydrocarbons
Nanoparticles
Plasmas
Coatings
Kinetic theory
Carbon films
Amorphous carbon
Poisson equation
Amorphous films
Reaction kinetics
Deposits
Vacuum
Electrons
Ions

All Science Journal Classification (ASJC) codes

  • Energy(all)

Cite this

Yarin, A. L., Rovagnati, B., Mashayek, F., & Matsoukas, T. (2005). A reaction model for plasma coating of nanoparticles in hydrocarbon plasma. In 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings (Vol. 2005). American Institute of Chemical Engineers.
Yarin, Alexander L. ; Rovagnati, Beniamino ; Mashayek, Farzad ; Matsoukas, Themis. / A reaction model for plasma coating of nanoparticles in hydrocarbon plasma. 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings. Vol. 2005 American Institute of Chemical Engineers, 2005.
@inproceedings{3933fced9e0d4a94a1be278b96639b8b,
title = "A reaction model for plasma coating of nanoparticles in hydrocarbon plasma",
abstract = "A detailed chemical kinetics scheme of the reactions occurring in a CH4/H2 plasma is used to model the deposition of amorphous carbon films onto submicron particle suspended in the plasma. The model includes electron-neutral, ion-neutral, and neutral-neutral reactions and solves for the radial distribution of species in the vicinity of the particle. Concentration profiles are obtained by solving simultaneously the diffusion equation for all species that deposit on the particle surface, and the Poisson equation for the charge-carrying species. To accommodate the low-pressure environment, the continuum equations are solved to within one mean-free path from the particle surface while kinetic theory is used to treat phenomena inside the vacuum sphere, i.e., at distances shorter than one mean-free path. Calculations at various plasma conditions and the results observed trends in light of available experimental data are presented. This is an abstract of a paper presented at the AIChE Annual Meeting and Fall Showcase (Cincinnati, OH 10/30/2005-11/4/2005).",
author = "Yarin, {Alexander L.} and Beniamino Rovagnati and Farzad Mashayek and Themis Matsoukas",
year = "2005",
language = "English (US)",
isbn = "0816909962",
volume = "2005",
booktitle = "05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings",
publisher = "American Institute of Chemical Engineers",
address = "United States",

}

Yarin, AL, Rovagnati, B, Mashayek, F & Matsoukas, T 2005, A reaction model for plasma coating of nanoparticles in hydrocarbon plasma. in 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings. vol. 2005, American Institute of Chemical Engineers, 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States, 10/30/05.

A reaction model for plasma coating of nanoparticles in hydrocarbon plasma. / Yarin, Alexander L.; Rovagnati, Beniamino; Mashayek, Farzad; Matsoukas, Themis.

05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings. Vol. 2005 American Institute of Chemical Engineers, 2005.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - A reaction model for plasma coating of nanoparticles in hydrocarbon plasma

AU - Yarin, Alexander L.

AU - Rovagnati, Beniamino

AU - Mashayek, Farzad

AU - Matsoukas, Themis

PY - 2005

Y1 - 2005

N2 - A detailed chemical kinetics scheme of the reactions occurring in a CH4/H2 plasma is used to model the deposition of amorphous carbon films onto submicron particle suspended in the plasma. The model includes electron-neutral, ion-neutral, and neutral-neutral reactions and solves for the radial distribution of species in the vicinity of the particle. Concentration profiles are obtained by solving simultaneously the diffusion equation for all species that deposit on the particle surface, and the Poisson equation for the charge-carrying species. To accommodate the low-pressure environment, the continuum equations are solved to within one mean-free path from the particle surface while kinetic theory is used to treat phenomena inside the vacuum sphere, i.e., at distances shorter than one mean-free path. Calculations at various plasma conditions and the results observed trends in light of available experimental data are presented. This is an abstract of a paper presented at the AIChE Annual Meeting and Fall Showcase (Cincinnati, OH 10/30/2005-11/4/2005).

AB - A detailed chemical kinetics scheme of the reactions occurring in a CH4/H2 plasma is used to model the deposition of amorphous carbon films onto submicron particle suspended in the plasma. The model includes electron-neutral, ion-neutral, and neutral-neutral reactions and solves for the radial distribution of species in the vicinity of the particle. Concentration profiles are obtained by solving simultaneously the diffusion equation for all species that deposit on the particle surface, and the Poisson equation for the charge-carrying species. To accommodate the low-pressure environment, the continuum equations are solved to within one mean-free path from the particle surface while kinetic theory is used to treat phenomena inside the vacuum sphere, i.e., at distances shorter than one mean-free path. Calculations at various plasma conditions and the results observed trends in light of available experimental data are presented. This is an abstract of a paper presented at the AIChE Annual Meeting and Fall Showcase (Cincinnati, OH 10/30/2005-11/4/2005).

UR - http://www.scopus.com/inward/record.url?scp=33646753858&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33646753858&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:33646753858

SN - 0816909962

SN - 9780816909964

VL - 2005

BT - 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings

PB - American Institute of Chemical Engineers

ER -

Yarin AL, Rovagnati B, Mashayek F, Matsoukas T. A reaction model for plasma coating of nanoparticles in hydrocarbon plasma. In 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings. Vol. 2005. American Institute of Chemical Engineers. 2005