In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.
|Original language||English (US)|
|Number of pages||4|
|Journal||Physics Letters, Section A: General, Atomic and Solid State Physics|
|State||Published - Oct 15 2013|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)