A reduced model for nanoparticle coating in non-equilibrium plasma

B. Rovagnati, A. L. Yarin, F. Mashayek, Themis Matsoukas

Research output: Contribution to journalArticle

Abstract

In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

Original languageEnglish (US)
Pages (from-to)1745-1748
Number of pages4
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume377
Issue number28-30
DOIs
StatePublished - Oct 15 2013

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nonequilibrium plasmas
coatings
nanoparticles
reactors
hydrogen plasma
methane
low pressure
chemistry
carbon

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

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abstract = "In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.",
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A reduced model for nanoparticle coating in non-equilibrium plasma. / Rovagnati, B.; Yarin, A. L.; Mashayek, F.; Matsoukas, Themis.

In: Physics Letters, Section A: General, Atomic and Solid State Physics, Vol. 377, No. 28-30, 15.10.2013, p. 1745-1748.

Research output: Contribution to journalArticle

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AU - Yarin, A. L.

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AB - In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

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