A spherical-aberration-corrected 200 kV transmission electron microscope

Max Haider; Harald Rose; Stephan Uhlemann; Eugen Schwan; Bernd Kabius; Knut Urban

doi:10.1016/S0304-3991(98)00048-5

A spherical-aberration-corrected 200 kV transmission electron microscope

Max Haider, Harald Rose, Stephan Uhlemann, Eugen Schwan, Bernd Kabius, Knut Urban

Materials Research Institute (MRI)

Research output: Contribution to journal › Article › peer-review

343 Scopus citations

Abstract

A hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron microscope. Implementing this system on a commercial 200 kV instrument with a field emission gun the spherical aberration correction was demonstrated and an improvement of the point resolution from 0.24 nm to better than 0.14 nm was realized. Applying the new instrument to structure studies on Si/CoSi₂ interfaces it was demonstrated that an outstanding additional advantage of aberration correction is the substantially reduced contrast delocalization in high-resolution images.

Original language	English (US)
Pages (from-to)	53-60
Number of pages	8
Journal	Ultramicroscopy
Volume	75
Issue number	1
DOIs	https://doi.org/10.1016/S0304-3991(98)00048-5
State	Published - Oct 1 1998

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/S0304-3991(98)00048-5

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title = "A spherical-aberration-corrected 200 kV transmission electron microscope",

abstract = "A hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron microscope. Implementing this system on a commercial 200 kV instrument with a field emission gun the spherical aberration correction was demonstrated and an improvement of the point resolution from 0.24 nm to better than 0.14 nm was realized. Applying the new instrument to structure studies on Si/CoSi2 interfaces it was demonstrated that an outstanding additional advantage of aberration correction is the substantially reduced contrast delocalization in high-resolution images.",

author = "Max Haider and Harald Rose and Stephan Uhlemann and Eugen Schwan and Bernd Kabius and Knut Urban",

note = "Funding Information: We thank the Volkswagen-Stiftung for funding this project. Its realization would not have been possible without the support of L. Philipson, former Director-General of EMBL, and of J. Treusch, Chairman of the Board of Research Centre J{\"u}lich. Thanks are due to the members of the workshops at EMBL and to H. Wittman for technical assistance and to J. Zach for innumerable helpful discussions. We are also grateful, in particular to K. van der Mast, for the support provided by Philips Electron Optics. The Si/CoSi 2 samples were generously provided by S. Mantl, F. Klinkhammer and St. Meesters.",

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doi = "10.1016/S0304-3991(98)00048-5",

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AU - Haider, Max

AU - Rose, Harald

AU - Uhlemann, Stephan

AU - Schwan, Eugen

AU - Kabius, Bernd

AU - Urban, Knut

N1 - Funding Information: We thank the Volkswagen-Stiftung for funding this project. Its realization would not have been possible without the support of L. Philipson, former Director-General of EMBL, and of J. Treusch, Chairman of the Board of Research Centre Jülich. Thanks are due to the members of the workshops at EMBL and to H. Wittman for technical assistance and to J. Zach for innumerable helpful discussions. We are also grateful, in particular to K. van der Mast, for the support provided by Philips Electron Optics. The Si/CoSi 2 samples were generously provided by S. Mantl, F. Klinkhammer and St. Meesters.

PY - 1998/10/1

Y1 - 1998/10/1

N2 - A hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron microscope. Implementing this system on a commercial 200 kV instrument with a field emission gun the spherical aberration correction was demonstrated and an improvement of the point resolution from 0.24 nm to better than 0.14 nm was realized. Applying the new instrument to structure studies on Si/CoSi2 interfaces it was demonstrated that an outstanding additional advantage of aberration correction is the substantially reduced contrast delocalization in high-resolution images.

AB - A hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron microscope. Implementing this system on a commercial 200 kV instrument with a field emission gun the spherical aberration correction was demonstrated and an improvement of the point resolution from 0.24 nm to better than 0.14 nm was realized. Applying the new instrument to structure studies on Si/CoSi2 interfaces it was demonstrated that an outstanding additional advantage of aberration correction is the substantially reduced contrast delocalization in high-resolution images.

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A spherical-aberration-corrected 200 kV transmission electron microscope

Abstract

All Science Journal Classification (ASJC) codes

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