Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

Hun Gi Hong, Debra D. Sackett, Thomas E. Mallouk

Research output: Contribution to journalArticle

108 Citations (Scopus)

Abstract

Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

Original languageEnglish (US)
Pages (from-to)521-527
Number of pages7
JournalChemistry of Materials
Volume3
Issue number3
DOIs
StatePublished - May 1 1991

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Organophosphonates
Multilayer films
Zirconium
Silicon Dioxide
Silica
Adsorption
Bearings (structural)
X ray diffraction
Linewidth
X ray powder diffraction
Infrared spectroscopy
Multilayers
Molecules
Acids
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Cite this

Hong, Hun Gi ; Sackett, Debra D. ; Mallouk, Thomas E. / Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica. In: Chemistry of Materials. 1991 ; Vol. 3, No. 3. pp. 521-527.
@article{73d952cf287c46e58bf1493280fb635c,
title = "Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica",
abstract = "Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 {\AA} by X-ray diffraction.",
author = "Hong, {Hun Gi} and Sackett, {Debra D.} and Mallouk, {Thomas E.}",
year = "1991",
month = "5",
day = "1",
doi = "10.1021/cm00015a030",
language = "English (US)",
volume = "3",
pages = "521--527",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "3",

}

Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica. / Hong, Hun Gi; Sackett, Debra D.; Mallouk, Thomas E.

In: Chemistry of Materials, Vol. 3, No. 3, 01.05.1991, p. 521-527.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

AU - Hong, Hun Gi

AU - Sackett, Debra D.

AU - Mallouk, Thomas E.

PY - 1991/5/1

Y1 - 1991/5/1

N2 - Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

AB - Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

UR - http://www.scopus.com/inward/record.url?scp=0001570343&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001570343&partnerID=8YFLogxK

U2 - 10.1021/cm00015a030

DO - 10.1021/cm00015a030

M3 - Article

AN - SCOPUS:0001570343

VL - 3

SP - 521

EP - 527

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 3

ER -