Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

Hun Gi Hong, Debra D. Sackett, Thomas E. Mallouk

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Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

Original languageEnglish (US)
Pages (from-to)521-527
Number of pages7
JournalChemistry of Materials
Issue number3
StatePublished - May 1 1991


All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

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