Alignment tolerances for off-plane reflection grating spectrometry: Theoretical calculations and laboratory techniques

Ryan Allured, Benjamin D. Donovan, Randall Lee McEntaffer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

Off-plane reflection gratings can be used to provide high throughput and spectral resolution in the 0.3-2.0 keV band, allowing for unprecedented diagnostics of energetic astrophysical processes. A grating spectrometer consists of multiple aligned gratings intersecting the converging beam of a Wolter-I telescope. Each grating will be aligned such that the diffracted spectra overlap at the focal plane. Misalignments will degrade both spectral resolution and effective area. In this paper we present a summary of analytical alignment tolerance calculations, including an investigation of diffraction efficiency alignment dependence. Our plan for extending this work to future modeling and simulation is laid out. Finally, we report on the status of laboratory techniques to achieve these tolerances for flight-like optics.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI
DOIs
StatePublished - Nov 7 2013
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI - San Diego, CA, United States
Duration: Aug 26 2013Aug 29 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8861
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI
CountryUnited States
CitySan Diego, CA
Period8/26/138/29/13

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Allured, R., Donovan, B. D., & McEntaffer, R. L. (2013). Alignment tolerances for off-plane reflection grating spectrometry: Theoretical calculations and laboratory techniques. In Optics for EUV, X-Ray, and Gamma-Ray Astronomy VI [88611C] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8861). https://doi.org/10.1117/12.2022873