An electrically-detected magnetic resonance study of the atomic-scale effects of fluorine on the negative bias temperature instability

J. T. Ryan, P. M. Lenahan, A. T. Krishnan, S. Krishnan, J. P. Campbell

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

It has been shown that the negative bias temperature instability (NBTI) may be significantly suppressed through the incorporation of fluorine in the gate oxide. In this study, we use the electrically-detected magnetic resonance technique of spin dependent recombination and standard gated diode current measurements to investigate the atomic-scale processes involved in fluorine's suppression of NBTI. Our results indicate that fluorine effectively passivates Si/SiO 2 P b0 center defect precursors, but is much less effective at passivating Si/SiO 2 P b1 center defect precursors. Since these two defects have significantly different densities of states, our results maybe useful in modeling NBTI response in fluorinated oxide devices. Our results also help to provide a fundamental explanation for the observation that fluorination has a strong effect on NBTI in "pure" SiO 2 MOS devices, but is ineffective at reducing NBTI in nitrided oxide devices.

Original languageEnglish (US)
Title of host publication2008 IEEE International Integrated Reliability Workshop Final Report, IRW 2008
Pages137-140
Number of pages4
DOIs
Publication statusPublished - Dec 1 2008
Event2008 IEEE International Integrated Reliability Workshop, IRW 2008 - South Lake Tahoe, CA, United States
Duration: Oct 12 2008Oct 16 2008

Publication series

NameIEEE International Integrated Reliability Workshop Final Report

Other

Other2008 IEEE International Integrated Reliability Workshop, IRW 2008
CountryUnited States
CitySouth Lake Tahoe, CA
Period10/12/0810/16/08

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality
  • Electronic, Optical and Magnetic Materials

Cite this

Ryan, J. T., Lenahan, P. M., Krishnan, A. T., Krishnan, S., & Campbell, J. P. (2008). An electrically-detected magnetic resonance study of the atomic-scale effects of fluorine on the negative bias temperature instability. In 2008 IEEE International Integrated Reliability Workshop Final Report, IRW 2008 (pp. 137-140). [4796105] (IEEE International Integrated Reliability Workshop Final Report). https://doi.org/10.1109/IRWS.2008.4796105