Anodization of sputtered metallic films: The microstructural connection

Tanushree H. Choudhury, Srinivasan Raghavan

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

A simple microstructural rationale for successful anodization of metallic films into ordered oxide nanostructures has been identified. It applies to three of the most commonly studied systems, Zr, Ti and Al films and can be extended to other such oxides. A dense Zone T or II microstructure, in sputtered films, is the most critical ingredient. While Tsubstrate > 0.3Tmelting is the simplest route, pressure and plasma heating can also be exploited. Such microstructures are also associated with a unique growth stress signature.

Original languageEnglish (US)
Pages (from-to)18-21
Number of pages4
JournalScripta Materialia
Volume105
DOIs
StatePublished - Aug 1 2015

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

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