Anodization of sputtered metallic films: The microstructural connection

Tanushree Holme Choudhury, Srinivasan Raghavan

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A simple microstructural rationale for successful anodization of metallic films into ordered oxide nanostructures has been identified. It applies to three of the most commonly studied systems, Zr, Ti and Al films and can be extended to other such oxides. A dense Zone T or II microstructure, in sputtered films, is the most critical ingredient. While Tsubstrate > 0.3Tmelting is the simplest route, pressure and plasma heating can also be exploited. Such microstructures are also associated with a unique growth stress signature.

Original languageEnglish (US)
Pages (from-to)18-21
Number of pages4
JournalScripta Materialia
Volume105
DOIs
StatePublished - Aug 1 2015

Fingerprint

Metallic films
Oxides
Plasma heating
Microstructure
Nanostructures
microstructure
heating
plasma heating
oxides
ingredients
routes
signatures

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

Cite this

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Anodization of sputtered metallic films : The microstructural connection. / Choudhury, Tanushree Holme; Raghavan, Srinivasan.

In: Scripta Materialia, Vol. 105, 01.08.2015, p. 18-21.

Research output: Contribution to journalArticle

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