Aromatizing unzipping polyester for EUV photoresist

Kensuke Matsuzawa, Ryan Mesch, Michael Olah, Wade Wang, Scott T. Phillips, C. Grant Willson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

New "self-immolating" or "unzipping" polymers, materials that depolymerize in response to irradiation, were designed and prepared successfully. We studied several candidate polymers and ultimately chose two of them for further development. One is a polyester that aromatizes upon depolymerization. The unzipping reaction initiated by UV exposure in solution was confirmed. The polymer was then studied in thin films to assess its potential for use in formulating photoresists. The neat polymer was tested as a blend with novolac resin. The effect of unzipping polyester loading in novolac on the rate of dissolution of films in TMAH was studied. Inhibition occurs at 20-30% loading. The films were exposed with DUV light and patterning was observed. The sensitivity of the unzipping polyester formulation is low in part due to the low absorption of the polymer for UV light. However, the polymer showed higher sensitivity with EUV exposure and first contrast curves show sensitivity in the range of 20-25mJ/cm2.

Original languageEnglish (US)
Title of host publicationAdvances in Patterning Materials and Processes XXXII
EditorsThomas I. Wallow, Christoph K. Hohle
PublisherSPIE
ISBN (Electronic)9781628415278
DOIs
StatePublished - Jan 1 2015
EventAdvances in Patterning Materials and Processes XXXII - San Jose, United States
Duration: Feb 23 2015Feb 26 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9425
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAdvances in Patterning Materials and Processes XXXII
CountryUnited States
CitySan Jose
Period2/23/152/26/15

Fingerprint

Polyesters
Photoresist
polyesters
Photoresists
photoresists
Polymers
polymers
sensitivity
depolymerization
high polymers
Depolymerization
Dissolution
resins
Polymer blends
Patterning
dissolving
Ultraviolet radiation
Irradiation
Thin Films
Absorption

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Matsuzawa, K., Mesch, R., Olah, M., Wang, W., Phillips, S. T., & Willson, C. G. (2015). Aromatizing unzipping polyester for EUV photoresist. In T. I. Wallow, & C. K. Hohle (Eds.), Advances in Patterning Materials and Processes XXXII [94251Q] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9425). SPIE. https://doi.org/10.1117/12.2085780
Matsuzawa, Kensuke ; Mesch, Ryan ; Olah, Michael ; Wang, Wade ; Phillips, Scott T. ; Willson, C. Grant. / Aromatizing unzipping polyester for EUV photoresist. Advances in Patterning Materials and Processes XXXII. editor / Thomas I. Wallow ; Christoph K. Hohle. SPIE, 2015. (Proceedings of SPIE - The International Society for Optical Engineering).
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Matsuzawa, K, Mesch, R, Olah, M, Wang, W, Phillips, ST & Willson, CG 2015, Aromatizing unzipping polyester for EUV photoresist. in TI Wallow & CK Hohle (eds), Advances in Patterning Materials and Processes XXXII., 94251Q, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9425, SPIE, Advances in Patterning Materials and Processes XXXII, San Jose, United States, 2/23/15. https://doi.org/10.1117/12.2085780

Aromatizing unzipping polyester for EUV photoresist. / Matsuzawa, Kensuke; Mesch, Ryan; Olah, Michael; Wang, Wade; Phillips, Scott T.; Willson, C. Grant.

Advances in Patterning Materials and Processes XXXII. ed. / Thomas I. Wallow; Christoph K. Hohle. SPIE, 2015. 94251Q (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9425).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Matsuzawa K, Mesch R, Olah M, Wang W, Phillips ST, Willson CG. Aromatizing unzipping polyester for EUV photoresist. In Wallow TI, Hohle CK, editors, Advances in Patterning Materials and Processes XXXII. SPIE. 2015. 94251Q. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2085780