Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors

Nick M. Sbrockey, Gary S. Tompa, Robert Lavelle, Kathleen A. Trumbull, Mark Andrew Fanton, David W. Snyder, Ronald G. Polcawich, Daniel M. Potrepka

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Atomic layer deposition (ALD) processes were demonstrated for lead-titanate (PbTiO3) and lead-zirconium-titanate (PZT) films. The metal organic precursors were tetraethyl lead Pb(Et)4 reacted with ozone; along with tetrakis ethylmethylamino zirconium and tetrakis dimethylamino titanium reacted with either water or ozone. These precursors were selected based on compatibility with ALD processes for the component oxides. Single oxide films of PbO, ZrO2, and TiO2 were easily deposited using the selected precursors. ALD of the complex oxide films was done by combining the ALD processes for the component oxide films. The compositions of Pb, Zr, and Ti in the films could be predictably controlled by the relative ratio of Pb, Zr, and Ti precursor doses during the ALD process, and controlled composition for both PbTiO3 and PZT films was demonstrated.

Original languageEnglish (US)
Article number031509
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume36
Issue number3
DOIs
StatePublished - May 2 2018

Fingerprint

Atomic layer deposition
atomic layer epitaxy
metal films
Metals
Zirconium
Oxide films
oxide films
Lead
Ozone
ozone
Tetraethyl Lead
Titanium
Chemical analysis
Oxides
compatibility
titanium
dosage
oxides
Water
metals

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Sbrockey, Nick M. ; Tompa, Gary S. ; Lavelle, Robert ; Trumbull, Kathleen A. ; Fanton, Mark Andrew ; Snyder, David W. ; Polcawich, Ronald G. ; Potrepka, Daniel M. / Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2018 ; Vol. 36, No. 3.
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Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors. / Sbrockey, Nick M.; Tompa, Gary S.; Lavelle, Robert; Trumbull, Kathleen A.; Fanton, Mark Andrew; Snyder, David W.; Polcawich, Ronald G.; Potrepka, Daniel M.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 36, No. 3, 031509, 02.05.2018.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors

AU - Sbrockey, Nick M.

AU - Tompa, Gary S.

AU - Lavelle, Robert

AU - Trumbull, Kathleen A.

AU - Fanton, Mark Andrew

AU - Snyder, David W.

AU - Polcawich, Ronald G.

AU - Potrepka, Daniel M.

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