Atomic layer deposition of TiO 2 on graphene for supercapacitors

Xiang Sun, Ming Xie, Gongkai Wang, Hongtao Sun, Andrew S. Cavanagh, Jonathan J. Travis, Steven M. George, Jie Lian

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147 Scopus citations

Abstract

A nano-scaled coating of titanium oxide (TiO 2) on graphene (G) has been achieved via a novel atomic layer deposition (ALD) method. As a potential supercapacitor material, the TiO 2-G composites exhibited a capacity of 75 Fg and 84 Fg at a scan rate of 10 mVs for composites grown using 50 and 100 ALD cycles, respectively. The nearly identical Nyquist plots of the TiO 2-G composites compared with those of pure graphene demonstrated that the composites possess excellent conductivity for charge transfer and open structures for ion diffusion. In addition, even with 3-4 times additional mass loading (maximum 3.22 mgcm 2), the composites exhibit no obvious degradation with respect to the electrochemical performance. This ALD approach presents a promising route to synthesize advanced graphene-based nanocomposites for supercapacitor applications.

Original languageEnglish (US)
Pages (from-to)A364-A369
JournalJournal of the Electrochemical Society
Volume159
Issue number4
DOIs
StatePublished - Feb 29 2012

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Sun, X., Xie, M., Wang, G., Sun, H., Cavanagh, A. S., Travis, J. J., George, S. M., & Lian, J. (2012). Atomic layer deposition of TiO 2 on graphene for supercapacitors. Journal of the Electrochemical Society, 159(4), A364-A369. https://doi.org/10.1149/2.025204jes