Atomistic mechanism of ion beam deposition induced curvature formation in thin-films

Sachin S. Terdalkar, Sulin Zhang, Joseph J. Rencis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Molecular dynamics (MD) simulations are performed to study the stress generation mechanisms in cantilever graphene sheets impacted by energetic carbon neutrals. The carbon-carbon interactions are described by the Tersoff-Brenner potential [1]. The MD simulations show that the free-end deflection of the graphene sheets is strongly dependent on the kinetic energy of the incident ions. At low incident energy (<<10eV), the free end bends towards to the side on which ions are deposited (upward deflection); at high incident energy, the free end bends away from the side on which the ions are deposited (downward deflection). The downward deflection reaches its maximum at around 50 eV, beyond which the downward deflection decreases with increasing incident energies. In addition, the evolution of the free-end deflection in terms of the number of deposited atoms is also dependent on the kinetic energy of the incident ions. These numerical observations suggest that intrinsic stress of different levels in the graphene sheets is generated. A close examination of the microstructures of the grown films indicates that the generated stress can be attributed to a competing mechanism of the production and annihilation of vacancy-like and interstitial-like defects in the films.

Original languageEnglish (US)
Title of host publicationMicro and Nano Systems
PublisherAmerican Society of Mechanical Engineers (ASME)
Pages1169-1174
Number of pages6
ISBN (Electronic)079184305X
DOIs
StatePublished - Jan 1 2007
EventASME 2007 International Mechanical Engineering Congress and Exposition, IMECE 2007 - Seattle, United States
Duration: Nov 11 2007Nov 15 2007

Publication series

NameASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)
Volume11

Other

OtherASME 2007 International Mechanical Engineering Congress and Exposition, IMECE 2007
CountryUnited States
CitySeattle
Period11/11/0711/15/07

Fingerprint

Ion beams
Graphene
Thin films
Ions
Kinetic energy
Carbon
Molecular dynamics
Computer simulation
Vacancies
Atoms
Defects
Microstructure

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Cite this

Terdalkar, S. S., Zhang, S., & Rencis, J. J. (2007). Atomistic mechanism of ion beam deposition induced curvature formation in thin-films. In Micro and Nano Systems (pp. 1169-1174). (ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE); Vol. 11). American Society of Mechanical Engineers (ASME). https://doi.org/10.1115/IMECE200741896
Terdalkar, Sachin S. ; Zhang, Sulin ; Rencis, Joseph J. / Atomistic mechanism of ion beam deposition induced curvature formation in thin-films. Micro and Nano Systems. American Society of Mechanical Engineers (ASME), 2007. pp. 1169-1174 (ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)).
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Terdalkar, SS, Zhang, S & Rencis, JJ 2007, Atomistic mechanism of ion beam deposition induced curvature formation in thin-films. in Micro and Nano Systems. ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE), vol. 11, American Society of Mechanical Engineers (ASME), pp. 1169-1174, ASME 2007 International Mechanical Engineering Congress and Exposition, IMECE 2007, Seattle, United States, 11/11/07. https://doi.org/10.1115/IMECE200741896

Atomistic mechanism of ion beam deposition induced curvature formation in thin-films. / Terdalkar, Sachin S.; Zhang, Sulin; Rencis, Joseph J.

Micro and Nano Systems. American Society of Mechanical Engineers (ASME), 2007. p. 1169-1174 (ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE); Vol. 11).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Terdalkar SS, Zhang S, Rencis JJ. Atomistic mechanism of ion beam deposition induced curvature formation in thin-films. In Micro and Nano Systems. American Society of Mechanical Engineers (ASME). 2007. p. 1169-1174. (ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)). https://doi.org/10.1115/IMECE200741896