C 60 molecular depth profiling of a model polymer

C. Szakal, S. Sun, A. Wucher, N. Winograd

Research output: Contribution to journalArticle

59 Scopus citations

Abstract

The bombardment of a 26nm poly(methyl methacrylate) (PMMA) film has been studied as a model for depth profiling of polymeric samples using a newly developed C 60 + ion source. Experiments were conducted on a ToF-SIMS instrument equipped with C 60 + and Ga + ion sources. A focused dc C 60 + ion beam was used to etch through the polymer sample at specified time intervals. Subsequent spectra were recorded after each individual etching cycle using both C 60 + 20keV and Ga + 15keV ion beams at field-of-views smaller than the sputter area. PMMA fragment ion at m/z=69 and substrate Au m/z=197 were monitored with respect to primary ion doses of up to 10 14 ions/ cm 2 . Depth resolution as determined by the interfacial region is found to be about 14nm. A >10-fold increase in sputter yield for C 60 + ion bombardment over Ga + ions under similar conditions is observed from quartz crystal microbalance (QCM) measurements and our findings compare to enhanced SF 5 + cluster bombardment yields of organic species.

Original languageEnglish (US)
Pages (from-to)183-185
Number of pages3
JournalApplied Surface Science
Volume231-232
DOIs
StatePublished - Jun 15 2004

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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