Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian, Brock Landon Weiss, R. Roy, T. Badzian, W. Drawl, P. Mistry, M. C. Turchan

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

Original languageEnglish (US)
Pages (from-to)64-69
Number of pages6
JournalDiamond and Related Materials
Volume7
Issue number1
DOIs
StatePublished - Jan 1 1998

Fingerprint

Diamond
Field emission
electron emission
field emission
Diamonds
diamonds
coatings
Coatings
Electrons
Lasers
Cobalt
lasers
cobalt
Flat panel displays
Tungsten
flat panel displays
Beam plasma interactions
Cutting tools
inserts
Hydrogen

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

Badzian, A. ; Weiss, Brock Landon ; Roy, R. ; Badzian, T. ; Drawl, W. ; Mistry, P. ; Turchan, M. C. / Characterization and electron field emission from diamond coatings deposited by multiple laser process. In: Diamond and Related Materials. 1998 ; Vol. 7, No. 1. pp. 64-69.
@article{36de7355597849eabd92a3b786d0189c,
title = "Characterization and electron field emission from diamond coatings deposited by multiple laser process",
abstract = "A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.",
author = "A. Badzian and Weiss, {Brock Landon} and R. Roy and T. Badzian and W. Drawl and P. Mistry and Turchan, {M. C.}",
year = "1998",
month = "1",
day = "1",
doi = "10.1016/S0925-9635(97)00182-9",
language = "English (US)",
volume = "7",
pages = "64--69",
journal = "Diamond and Related Materials",
issn = "0925-9635",
publisher = "Elsevier BV",
number = "1",

}

Characterization and electron field emission from diamond coatings deposited by multiple laser process. / Badzian, A.; Weiss, Brock Landon; Roy, R.; Badzian, T.; Drawl, W.; Mistry, P.; Turchan, M. C.

In: Diamond and Related Materials, Vol. 7, No. 1, 01.01.1998, p. 64-69.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Characterization and electron field emission from diamond coatings deposited by multiple laser process

AU - Badzian, A.

AU - Weiss, Brock Landon

AU - Roy, R.

AU - Badzian, T.

AU - Drawl, W.

AU - Mistry, P.

AU - Turchan, M. C.

PY - 1998/1/1

Y1 - 1998/1/1

N2 - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

AB - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

UR - http://www.scopus.com/inward/record.url?scp=0031619339&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031619339&partnerID=8YFLogxK

U2 - 10.1016/S0925-9635(97)00182-9

DO - 10.1016/S0925-9635(97)00182-9

M3 - Article

VL - 7

SP - 64

EP - 69

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

IS - 1

ER -