Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian, Brock Landon Weiss, R. Roy, T. Badzian, W. Drawl, P. Mistry, M. C. Turchan

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

Original languageEnglish (US)
Pages (from-to)64-69
Number of pages6
JournalDiamond and Related Materials
Volume7
Issue number1
DOIs
StatePublished - Jan 1 1998

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

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