Spectroscopic ellipsometry was used to rapidly and nonde‐ structively characterize ion‐plated SiO2 and Ta2O5 films on glass substrates as a function of temperature. The analysis provided the density (as a function of depth) and optical properties of the films. The SiO2 film had a higher refractive index than is typical for thermally grown SiO2. This was attributed to compaction of the film during the deposition process. Similarly, the ion‐plated Ta2O5 film had the high refractive index characteristic of a high‐density film. The films were not affected strongly by temperature during heating >100°C.
|Original language||English (US)|
|Number of pages||5|
|Journal||Journal of the American Ceramic Society|
|State||Published - Sep 1995|
All Science Journal Classification (ASJC) codes
- Ceramics and Composites
- Materials Chemistry