CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.

P. A. Lester, R. Singh, D. A. Rice, R. N. Pangborn, S. Ashok, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherElsevier Science Publ Co
Pages199-204
Number of pages6
Volume5
ISBN (Print)0444006974
StatePublished - 1982

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

Lester, P. A., Singh, R., Rice, D. A., Pangborn, R. N., Ashok, S., & Fonash, S. J. (1982). CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON. In Materials Research Society Symposia Proceedings (Vol. 5, pp. 199-204). Elsevier Science Publ Co.