Chemical beam deposition of high-k gate dielectrics on III-V semiconductors: TiO2 on In0.53Ga0.47As

Roman Engel-Herbert, Yoontae Hwang, James M. LeBeau, Yan Zheng, Susanne Stemmer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy