Chemical reaction dynamics of F atom reaction with the dimer reconstructed Si {100} (2 × 1) surface

T. A. Schoolcraft, B. J. Garrison

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

We have calculated the initial sticking probability S0for near thermal atomic fluorine on the clean dimer reconstructed Si{ 100} (2x1) surface to be near unity using molecular dynamics simulations. The dependence of the sticking probability on coverage decreases to approximately zero for the fully fluorinated surface. The sticking probability of an F atom on a fully fluorinated silicon surface increases when the kinetic energy of the fluorine atom is above 0.50 eV.

Original languageEnglish (US)
Pages (from-to)3496-3501
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume8
Issue number4
DOIs
StatePublished - Jul 1990

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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