Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

S. L. Riedinger, D. W. Snyder, E. I. Ko, P. J. Sides

Research output: Contribution to journalLetter

5 Scopus citations

Abstract

The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

Original languageEnglish (US)
Pages (from-to)L9-L12
JournalMaterials Science and Engineering B
Volume15
Issue number2
DOIs
StatePublished - Nov 1 1992

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Chemimechanical polishing of cadmium telluride with bromine-methanol solutions'. Together they form a unique fingerprint.

  • Cite this