The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering