Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

S. L. Riedinger, David W. Snyder, E. I. Ko, P. J. Sides

Research output: Contribution to journalLetter

5 Citations (Scopus)

Abstract

The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

Original languageEnglish (US)
JournalMaterials Science and Engineering B
Volume15
Issue number2
DOIs
StatePublished - Nov 1 1992

Fingerprint

Cadmium telluride
Bromine
cadmium tellurides
bromine
Polishing
polishing
Methanol
methyl alcohol
Substrates
Surface morphology
Etching
etching
room temperature
cadmium telluride
Temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.",
author = "Riedinger, {S. L.} and Snyder, {David W.} and Ko, {E. I.} and Sides, {P. J.}",
year = "1992",
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journal = "Materials Science and Engineering B: Solid-State Materials for Advanced Technology",
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Chemimechanical polishing of cadmium telluride with bromine-methanol solutions. / Riedinger, S. L.; Snyder, David W.; Ko, E. I.; Sides, P. J.

In: Materials Science and Engineering B, Vol. 15, No. 2, 01.11.1992.

Research output: Contribution to journalLetter

TY - JOUR

T1 - Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

AU - Riedinger, S. L.

AU - Snyder, David W.

AU - Ko, E. I.

AU - Sides, P. J.

PY - 1992/11/1

Y1 - 1992/11/1

N2 - The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

AB - The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

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U2 - 10.1016/0921-5107(92)90056-F

DO - 10.1016/0921-5107(92)90056-F

M3 - Letter

AN - SCOPUS:0026946269

VL - 15

JO - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

JF - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

SN - 0921-5107

IS - 2

ER -