Chemistry of metal atoms reacting with alkanethiol self-assembled monolayers

Z. Zhu, D. L. Allara, Nicholas Winograd

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is utilized to investigate the behavior of vapor-deposited K, Au and Ti atoms on several alkanethiol self-assembled monolayers (SAM). The goals are to acquire information about chemical reactions between metal atoms and surface organic functional groups, penetration of metal atoms through the SAMs, growth modes of metal overlayers on top of the SAMs and damage of organic molecules. It is found that appearance of new characteristic peaks and disappearance of initial peaks may indicate chemical reactions or decomposition of organic molecules. The relationship between metal dose and intensity of surface organic functional group-related peaks provides information about penetration or cluster-formation of metal atoms. In addition, removing the metal overlayers by chemical etching and then characterizing samples again is a complementary approach that can reveal valuable information about the location of the metal atoms.

Original languageEnglish (US)
Pages (from-to)6686-6688
Number of pages3
JournalApplied Surface Science
Volume252
Issue number19
DOIs
StatePublished - Jul 30 2006

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Self assembled monolayers
Metals
chemistry
Atoms
metals
atoms
Functional groups
Chemical reactions
chemical reactions
penetration
Molecules
Secondary ion mass spectrometry
secondary ion mass spectrometry
molecules
Etching
Vapors
etching
vapors
damage
Decomposition

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

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Chemistry of metal atoms reacting with alkanethiol self-assembled monolayers. / Zhu, Z.; Allara, D. L.; Winograd, Nicholas.

In: Applied Surface Science, Vol. 252, No. 19, 30.07.2006, p. 6686-6688.

Research output: Contribution to journalArticle

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AU - Winograd, Nicholas

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