Colloidal lithography - The art of nanochemical patterning

Gang Zhang, Dayang Wang

Research output: Contribution to journalReview article

124 Citations (Scopus)

Abstract

Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and nonplanar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise mamipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography. This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.

Original languageEnglish (US)
Pages (from-to)236-245
Number of pages10
JournalChemistry - An Asian Journal
Volume4
Issue number2
DOIs
StatePublished - Feb 2 2009

Fingerprint

Art
Masks
Lithography
Etching
Fabrication
Nanostructures
Microspheres
Registries
Crystal structure
Vapors
Throughput
Costs and Cost Analysis
Crystals
Incidence
Substrates
Processing
Costs

All Science Journal Classification (ASJC) codes

  • Biochemistry
  • Organic Chemistry

Cite this

Zhang, Gang ; Wang, Dayang. / Colloidal lithography - The art of nanochemical patterning. In: Chemistry - An Asian Journal. 2009 ; Vol. 4, No. 2. pp. 236-245.
@article{8c52866803b241e38099e56d6d89dce3,
title = "Colloidal lithography - The art of nanochemical patterning",
abstract = "Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and nonplanar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise mamipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography. This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.",
author = "Gang Zhang and Dayang Wang",
year = "2009",
month = "2",
day = "2",
doi = "10.1002/asia.200800298",
language = "English (US)",
volume = "4",
pages = "236--245",
journal = "Chemistry - An Asian Journal",
issn = "1861-4728",
publisher = "John Wiley and Sons Ltd",
number = "2",

}

Colloidal lithography - The art of nanochemical patterning. / Zhang, Gang; Wang, Dayang.

In: Chemistry - An Asian Journal, Vol. 4, No. 2, 02.02.2009, p. 236-245.

Research output: Contribution to journalReview article

TY - JOUR

T1 - Colloidal lithography - The art of nanochemical patterning

AU - Zhang, Gang

AU - Wang, Dayang

PY - 2009/2/2

Y1 - 2009/2/2

N2 - Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and nonplanar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise mamipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography. This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.

AB - Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and nonplanar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise mamipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography. This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.

UR - http://www.scopus.com/inward/record.url?scp=59349112590&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=59349112590&partnerID=8YFLogxK

U2 - 10.1002/asia.200800298

DO - 10.1002/asia.200800298

M3 - Review article

VL - 4

SP - 236

EP - 245

JO - Chemistry - An Asian Journal

JF - Chemistry - An Asian Journal

SN - 1861-4728

IS - 2

ER -