Comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry

Zhe Ning, James R. Moyne, Taber Smith, Duane Boning, Enrique Del Castillo, Jinn Yi Yeh, Arnon Hurwitz

Research output: Contribution to conferencePaper

26 Scopus citations

Abstract

A number of algorithms have been developed that are applicable to the run-to-run control of semiconductor manufacturing processes. The algorithm implementations include the linear approximation multivariate 'Gradual Mode' (GM) controller, a time-based extended GM (GMt), the Optimizing Adaptive Quality Controller (OAQC), and the Knowledge-based Interactive Run-to-run Controller (KIRC). Research and experimentation in process control in the industry to-date has revealed that no single algorithm is sufficiently robust to cover the entire domain of process control for most tools. Indeed the optimal control solution is a multi-branch approach to control that provides for the complementary utilization of a number of control algorithms, with the various algorithms utilized in sub-domains in which they are 'best' suited to provide control advice. Unfortunately this ideal solution cannot be realized because very little information is available on the suitable sub-domains of applicability of the various algorithms. This paper addresses this issue by providing a comparative analysis of a number of run-to-run control algorithms. Each algorithm is described so as to provide insight into its potential use in run-to-run control. A comparative study of the algorithms is then presented; comparison criteria include stability and ability to control in the face of noise and drift of linear and full-quadratic processes. Although the data presented does not represent an exhaustive comparison of the alternatives, it provides information that can be utilized to realize an effective multi-branch, multi-algorithm run-to-run control strategy.

Original languageEnglish (US)
Pages375-381
Number of pages7
StatePublished - Dec 1 1996
EventProceedings of the 1996 7th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 96 - Cambridge, MA, USA
Duration: Nov 12 1996Nov 14 1996

Other

OtherProceedings of the 1996 7th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 96
CityCambridge, MA, USA
Period11/12/9611/14/96

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Cite this

Ning, Z., Moyne, J. R., Smith, T., Boning, D., Del Castillo, E., Yeh, J. Y., & Hurwitz, A. (1996). Comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry. 375-381. Paper presented at Proceedings of the 1996 7th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 96, Cambridge, MA, USA, .