Abstract
Composition control in lead or bismuth based ferroelectric thin films was studied for rf magnetron, dc magnetron and ion beam sputter depositions with metal or oxide targets. For room temperature depositions, (1) control of the target surfaces, (2) suppression of harmful effects from negative ions and (3) control of oxygen content in the films were significant. The surface of the lead target gradually degrades and alters the lead flux extracted from the target. At low pressures resputtering from the film occurs by negative oxygen ions. It is necessary to put more oxygen into the films in the sputter depositions with metal targets and the ion beam sputter depositions. For high temperature depositions, a composition self control was observed for films deposited in excess lead environments.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 591-596 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 403 |
| State | Published - Dec 1 1996 |
| Event | Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Dec 1 1995 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering