Abstract
Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1647-1654 |
| Number of pages | 8 |
| Journal | Advanced Functional Materials |
| Volume | 23 |
| Issue number | 13 |
| DOIs | |
| State | Published - Apr 5 2013 |
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All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Materials Science(all)
- Condensed Matter Physics
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Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. / Sparks, Justin R.; He, Rongrui; Healy, Noel; Chaudhuri, Subhasis; Fitzgibbons, Thomas C.; Peacock, Anna C.; Sazio, Pier J.A.; Badding, John V.
In: Advanced Functional Materials, Vol. 23, No. 13, 05.04.2013, p. 1647-1654.Research output: Contribution to journal › Article
TY - JOUR
T1 - Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors
AU - Sparks, Justin R.
AU - He, Rongrui
AU - Healy, Noel
AU - Chaudhuri, Subhasis
AU - Fitzgibbons, Thomas C.
AU - Peacock, Anna C.
AU - Sazio, Pier J.A.
AU - Badding, John V.
PY - 2013/4/5
Y1 - 2013/4/5
N2 - Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
AB - Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
UR - http://www.scopus.com/inward/record.url?scp=84875852824&partnerID=8YFLogxK
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U2 - 10.1002/adfm.201202224
DO - 10.1002/adfm.201202224
M3 - Article
AN - SCOPUS:84875852824
VL - 23
SP - 1647
EP - 1654
JO - Advanced Functional Materials
JF - Advanced Functional Materials
SN - 1616-301X
IS - 13
ER -