Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors

Justin R. Sparks, Rongrui He, Noel Healy, Subhasis Chaudhuri, Thomas C. Fitzgibbons, Anna C. Peacock, Pier J.A. Sazio, John V. Badding

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Original languageEnglish (US)
Pages (from-to)1647-1654
Number of pages8
JournalAdvanced Functional Materials
Volume23
Issue number13
DOIs
StatePublished - Apr 5 2013

Fingerprint

Optical fibers
optical fibers
high aspect ratio
coatings
Coatings
Aspect ratio
templates
porosity
Silicon Dioxide
Film thickness
Chemical vapor deposition
flexibility
film thickness
Deposits
deposits
Silica
vapor deposition
silicon dioxide
synthesis
II-VI semiconductors

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Sparks, J. R., He, R., Healy, N., Chaudhuri, S., Fitzgibbons, T. C., Peacock, A. C., ... Badding, J. V. (2013). Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. Advanced Functional Materials, 23(13), 1647-1654. https://doi.org/10.1002/adfm.201202224
Sparks, Justin R. ; He, Rongrui ; Healy, Noel ; Chaudhuri, Subhasis ; Fitzgibbons, Thomas C. ; Peacock, Anna C. ; Sazio, Pier J.A. ; Badding, John V. / Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. In: Advanced Functional Materials. 2013 ; Vol. 23, No. 13. pp. 1647-1654.
@article{af8e6ecf4c144cee88723c70c11594ac,
title = "Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors",
abstract = "Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.",
author = "Sparks, {Justin R.} and Rongrui He and Noel Healy and Subhasis Chaudhuri and Fitzgibbons, {Thomas C.} and Peacock, {Anna C.} and Sazio, {Pier J.A.} and Badding, {John V.}",
year = "2013",
month = "4",
day = "5",
doi = "10.1002/adfm.201202224",
language = "English (US)",
volume = "23",
pages = "1647--1654",
journal = "Advanced Functional Materials",
issn = "1616-301X",
publisher = "Wiley-VCH Verlag",
number = "13",

}

Sparks, JR, He, R, Healy, N, Chaudhuri, S, Fitzgibbons, TC, Peacock, AC, Sazio, PJA & Badding, JV 2013, 'Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors', Advanced Functional Materials, vol. 23, no. 13, pp. 1647-1654. https://doi.org/10.1002/adfm.201202224

Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. / Sparks, Justin R.; He, Rongrui; Healy, Noel; Chaudhuri, Subhasis; Fitzgibbons, Thomas C.; Peacock, Anna C.; Sazio, Pier J.A.; Badding, John V.

In: Advanced Functional Materials, Vol. 23, No. 13, 05.04.2013, p. 1647-1654.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors

AU - Sparks, Justin R.

AU - He, Rongrui

AU - Healy, Noel

AU - Chaudhuri, Subhasis

AU - Fitzgibbons, Thomas C.

AU - Peacock, Anna C.

AU - Sazio, Pier J.A.

AU - Badding, John V.

PY - 2013/4/5

Y1 - 2013/4/5

N2 - Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

AB - Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

UR - http://www.scopus.com/inward/record.url?scp=84875852824&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84875852824&partnerID=8YFLogxK

U2 - 10.1002/adfm.201202224

DO - 10.1002/adfm.201202224

M3 - Article

AN - SCOPUS:84875852824

VL - 23

SP - 1647

EP - 1654

JO - Advanced Functional Materials

JF - Advanced Functional Materials

SN - 1616-301X

IS - 13

ER -