Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors

Justin R. Sparks, Rongrui He, Noel Healy, Subhasis Chaudhuri, Thomas C. Fitzgibbons, Anna C. Peacock, Pier J.A. Sazio, John V. Badding

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Abstract

Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Original languageEnglish (US)
Pages (from-to)1647-1654
Number of pages8
JournalAdvanced Functional Materials
Volume23
Issue number13
DOIs
StatePublished - Apr 5 2013

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All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Sparks, J. R., He, R., Healy, N., Chaudhuri, S., Fitzgibbons, T. C., Peacock, A. C., Sazio, P. J. A., & Badding, J. V. (2013). Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. Advanced Functional Materials, 23(13), 1647-1654. https://doi.org/10.1002/adfm.201202224