Control of moisture at buried polymer/alumina interfaces through substrate surface modification

Bryan D. Vogt, Vivek M. Prabhu, Christopher L. Soles, Sushil K. Satija, Eric K. Lin, Wen Li Wu

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Moisture absorption in poly(4-tert-butoxycarbonyloxystyrene) (PBOCSt) films supported on Al 2O 3 sputter coated silicon wafers is measured using neutron and X-ray reflectivity. Accumulation of water at the interface during moisture exposure results in an apparent film-thickness- dependent swelling for ultrathin PBOCSt films. The swelling of a film on Al 2O 3 is less than the swelling of a film of the same thickness on SiO x for films thinner than 20 nm. This is due to comparatively less moisture accumulation at the Al 2O 3/PBOCSt interface. A simple, zero adjustable parameter model consisting of a fixed water-rich layer at the interface and bulk swelling through the remainder of the film describes the thickness-dependent swelling quantitatively. The influence of four different Al 2O 3 surface treatments on the moisture distribution within PBOCSt films was examined: bare Al 2O 3, tert-butylphosphonic acid, phenylphosphonic acid, and n-octyltrichlorosilane. Both the phenyl and the octyl surface treatments reduce the accumulation of water at the polymer/substrate interface. The tert-butyl treatment does not reduce the interfacial water concentration, presumably due to insufficient surface coverage.

Original languageEnglish (US)
Pages (from-to)2460-2464
Number of pages5
JournalLangmuir
Volume21
Issue number6
DOIs
StatePublished - Mar 15 2005

Fingerprint

Aluminum Oxide
moisture
Swelling
Surface treatment
Polymers
Moisture
swelling
Alumina
aluminum oxides
polymers
Substrates
Water
surface treatment
water
Acids
Ultrathin films
acids
Silicon wafers
Film thickness
Neutrons

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Vogt, B. D., Prabhu, V. M., Soles, C. L., Satija, S. K., Lin, E. K., & Wu, W. L. (2005). Control of moisture at buried polymer/alumina interfaces through substrate surface modification. Langmuir, 21(6), 2460-2464. https://doi.org/10.1021/la0472549
Vogt, Bryan D. ; Prabhu, Vivek M. ; Soles, Christopher L. ; Satija, Sushil K. ; Lin, Eric K. ; Wu, Wen Li. / Control of moisture at buried polymer/alumina interfaces through substrate surface modification. In: Langmuir. 2005 ; Vol. 21, No. 6. pp. 2460-2464.
@article{24b2c8fdfd2e4a93ab3df938085cba76,
title = "Control of moisture at buried polymer/alumina interfaces through substrate surface modification",
abstract = "Moisture absorption in poly(4-tert-butoxycarbonyloxystyrene) (PBOCSt) films supported on Al 2O 3 sputter coated silicon wafers is measured using neutron and X-ray reflectivity. Accumulation of water at the interface during moisture exposure results in an apparent film-thickness- dependent swelling for ultrathin PBOCSt films. The swelling of a film on Al 2O 3 is less than the swelling of a film of the same thickness on SiO x for films thinner than 20 nm. This is due to comparatively less moisture accumulation at the Al 2O 3/PBOCSt interface. A simple, zero adjustable parameter model consisting of a fixed water-rich layer at the interface and bulk swelling through the remainder of the film describes the thickness-dependent swelling quantitatively. The influence of four different Al 2O 3 surface treatments on the moisture distribution within PBOCSt films was examined: bare Al 2O 3, tert-butylphosphonic acid, phenylphosphonic acid, and n-octyltrichlorosilane. Both the phenyl and the octyl surface treatments reduce the accumulation of water at the polymer/substrate interface. The tert-butyl treatment does not reduce the interfacial water concentration, presumably due to insufficient surface coverage.",
author = "Vogt, {Bryan D.} and Prabhu, {Vivek M.} and Soles, {Christopher L.} and Satija, {Sushil K.} and Lin, {Eric K.} and Wu, {Wen Li}",
year = "2005",
month = "3",
day = "15",
doi = "10.1021/la0472549",
language = "English (US)",
volume = "21",
pages = "2460--2464",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "6",

}

Vogt, BD, Prabhu, VM, Soles, CL, Satija, SK, Lin, EK & Wu, WL 2005, 'Control of moisture at buried polymer/alumina interfaces through substrate surface modification', Langmuir, vol. 21, no. 6, pp. 2460-2464. https://doi.org/10.1021/la0472549

Control of moisture at buried polymer/alumina interfaces through substrate surface modification. / Vogt, Bryan D.; Prabhu, Vivek M.; Soles, Christopher L.; Satija, Sushil K.; Lin, Eric K.; Wu, Wen Li.

In: Langmuir, Vol. 21, No. 6, 15.03.2005, p. 2460-2464.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Control of moisture at buried polymer/alumina interfaces through substrate surface modification

AU - Vogt, Bryan D.

AU - Prabhu, Vivek M.

AU - Soles, Christopher L.

AU - Satija, Sushil K.

AU - Lin, Eric K.

AU - Wu, Wen Li

PY - 2005/3/15

Y1 - 2005/3/15

N2 - Moisture absorption in poly(4-tert-butoxycarbonyloxystyrene) (PBOCSt) films supported on Al 2O 3 sputter coated silicon wafers is measured using neutron and X-ray reflectivity. Accumulation of water at the interface during moisture exposure results in an apparent film-thickness- dependent swelling for ultrathin PBOCSt films. The swelling of a film on Al 2O 3 is less than the swelling of a film of the same thickness on SiO x for films thinner than 20 nm. This is due to comparatively less moisture accumulation at the Al 2O 3/PBOCSt interface. A simple, zero adjustable parameter model consisting of a fixed water-rich layer at the interface and bulk swelling through the remainder of the film describes the thickness-dependent swelling quantitatively. The influence of four different Al 2O 3 surface treatments on the moisture distribution within PBOCSt films was examined: bare Al 2O 3, tert-butylphosphonic acid, phenylphosphonic acid, and n-octyltrichlorosilane. Both the phenyl and the octyl surface treatments reduce the accumulation of water at the polymer/substrate interface. The tert-butyl treatment does not reduce the interfacial water concentration, presumably due to insufficient surface coverage.

AB - Moisture absorption in poly(4-tert-butoxycarbonyloxystyrene) (PBOCSt) films supported on Al 2O 3 sputter coated silicon wafers is measured using neutron and X-ray reflectivity. Accumulation of water at the interface during moisture exposure results in an apparent film-thickness- dependent swelling for ultrathin PBOCSt films. The swelling of a film on Al 2O 3 is less than the swelling of a film of the same thickness on SiO x for films thinner than 20 nm. This is due to comparatively less moisture accumulation at the Al 2O 3/PBOCSt interface. A simple, zero adjustable parameter model consisting of a fixed water-rich layer at the interface and bulk swelling through the remainder of the film describes the thickness-dependent swelling quantitatively. The influence of four different Al 2O 3 surface treatments on the moisture distribution within PBOCSt films was examined: bare Al 2O 3, tert-butylphosphonic acid, phenylphosphonic acid, and n-octyltrichlorosilane. Both the phenyl and the octyl surface treatments reduce the accumulation of water at the polymer/substrate interface. The tert-butyl treatment does not reduce the interfacial water concentration, presumably due to insufficient surface coverage.

UR - http://www.scopus.com/inward/record.url?scp=15844426931&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=15844426931&partnerID=8YFLogxK

U2 - 10.1021/la0472549

DO - 10.1021/la0472549

M3 - Article

C2 - 15752040

AN - SCOPUS:15844426931

VL - 21

SP - 2460

EP - 2464

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 6

ER -