Controlled manipulation of wetting characteristics of nanoparticles with dry-based plasma polymerization method

Anaram Shahravan, Tapan Desai, Themis Matsoukas

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A dry process for tailoring nanoparticle wetting characteristics using plasma enhanced chemical vapor deposition technique is established. The "plasma polymer" coating imparts the properties of the precursors used in the plasma technique, without the requirement for nanoparticle surface preparation. For a range of chosen precursors, the water contact angle of a sessile droplet on coated copper oxide nanoparticles was shown to vary from 54 ° to 76 °, 92 ° to 108 °. Stable suspensions of coated nanoparticles were demonstrated.

Original languageEnglish (US)
Article number251603
JournalApplied Physics Letters
Issue number25
StatePublished - Dec 17 2012


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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