Controlling item exposure and test overlap in computerized adaptive testing

Shu Ying Chen, Pui Wa Lei

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

This article proposes an item exposure control method, which is the extension of the Sympson and Hetter procedure and can provide item exposure control at both the item and test levels. Item exposure rate and test overlap rate are two indices commonly used to track item exposure in computerized adaptive tests. By considering both indices, item exposure can be monitored at both the item and test levels. To control the item exposure rate and test overlap rate simultaneously, the modified procedure attempted to control not only the maximum value but also the variance of item exposure rates. Results indicated that the item exposure rate and test overlap rate could be controlled simultaneously by implementing the modified procedure. Item exposure control was improved and precision of trait estimation decreased when a prespecified maximum test overlap rate was stringent.

Original languageEnglish (US)
Pages (from-to)204-217
Number of pages14
JournalApplied Psychological Measurement
Volume29
Issue number3
DOIs
StatePublished - May 2005

All Science Journal Classification (ASJC) codes

  • Social Sciences (miscellaneous)
  • Psychology (miscellaneous)

Cite this