Coverage-dependent bond length of chlorine adsorbed on Cu{111}

W. K. Way, A. C. Pike, S. W. Rosencrance, R. M. Braun, Nicholas Winograd

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Abstract

The adsorption of Cl2 on Cu{111} at 300 K has been studied using shadow-cone-enhanced secondary ion mass spectrometry (SIMS). The system has been investigated for chlorine coverages ranging from 0.08 to 0.33 monolayer (ML), including the Cu{111}-(√3 × √3)R30°-Cl surface. The secondary Cu+ ion intensity has been measured as a function of the incidence angle of the primary ion beam. The enhanced intensity features in the spectra are compared with results from a two-body interaction calculation that uses the Molière approximation to the Thomas-Fermi potential. A chlorine-copper interlayer spacing of 1.87 ± 0.04 Å is measured between the coverages of 0.17 and 0.33 ML. This value corresponds to a chlorine-copper bond length of 2.38 ± 0.04 Å. At 0.08 ML, the chlorine-copper bond length is expanded to 2.48 ± 0.04 Å. These results suggest that the chlorine-copper bond is more ionic in the low coverage limit.

Original languageEnglish (US)
Pages (from-to)137-141
Number of pages5
JournalSurface and Interface Analysis
Volume24
Issue number2
DOIs
Publication statusPublished - Jan 1 1996

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All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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