Crossover between weak antilocalization and weak localization of bulk states in ultrathin Bi2Se3 films

Huichao Wang, Haiwen Liu, Cui Zu Chang, Huakun Zuo, Yanfei Zhao, Yi Sun, Zhengcai Xia, Ke He, Xucun Ma, X. C. Xie, Qi Kun Xue, Jian Wang

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

We report transport studies on the 5 nm thick Bi 2 Se 3 topological insulator films which are grown via molecular beam epitaxy technique. The angle-resolved photoemission spectroscopy data show that the Fermi level of the system lies in the bulk conduction band above the Dirac point, suggesting important contribution of bulk states to the transport results. In particular, the crossover from weak antilocalization to weak localization in the bulk states is observed in the parallel magnetic field measurements up to 50 Tesla. The measured magneto-resistance exhibits interesting anisotropy with respect to the orientation of parallel magnetic field B // and the current I, signifying intrinsic spin-orbit coupling in the Bi 2 Se 3 films. Our work directly shows the crossover of quantum interference effect in the bulk states from weak antilocalization to weak localization. It presents an important step toward a better understanding of the existing three-dimensional topological insulators and the potential applications of nano-scale topological insulator devices.

Original languageEnglish (US)
Article number5817
JournalScientific reports
Volume4
DOIs
StatePublished - Jul 24 2014

All Science Journal Classification (ASJC) codes

  • General

Fingerprint Dive into the research topics of 'Crossover between weak antilocalization and weak localization of bulk states in ultrathin Bi<sub>2</sub>Se<sub>3</sub> films'. Together they form a unique fingerprint.

Cite this