Current density effects on the microstructure of zirconium thin films

Zahabul Islam, Baoming Wang, Aman Haque

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

We investigate the effect of electrical current density below the electromigration failure limit in nanocrystalline zirconium thin films using in-situ Transmission Electron Microscope and molecular dynamics simulation. At least one order of magnitude higher growth was seen at current density of 8.5 × 105 A/cm2 (Joule heating temperature 710 K) in 15 min compared to conventional thermal annealing at 873 K for 360 min. Simulation results support our hypothesis that the concurrent effects of electron wind force and Joule heating specifically target the grain boundaries, producing much higher grain boundary mobility compared to high temperature annealing alone.

Original languageEnglish (US)
Pages (from-to)18-21
Number of pages4
JournalScripta Materialia
Volume144
DOIs
StatePublished - Feb 2018

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

Fingerprint

Dive into the research topics of 'Current density effects on the microstructure of zirconium thin films'. Together they form a unique fingerprint.

Cite this