Defects in Low-κ dielectrics and etch stop layers for use as interlay er dielectrics in ULSI

B. C. Bittel, T. A. Pomorski, Patrick M. Lenahan, S. King

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Fingerprint Dive into the research topics of 'Defects in Low-κ dielectrics and etch stop layers for use as interlay er dielectrics in ULSI'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science