Deposition and characterization of germanium sulphide glass planar waveguides

C. C. Huang, D. W. Hewak, John V. Badding

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 μm/hr at 500°C. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5μm to 7μm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.

Original languageEnglish (US)
Pages (from-to)2501-2506
Number of pages6
JournalOptics Express
Volume12
Issue number11
DOIs
StatePublished - May 31 2004

Fingerprint

sulfides
germanium
waveguides
glass
vapor deposition
prisms
Raman spectroscopy
refractivity
scanning electron microscopy
thin films
diffraction
spectroscopy
lasers
x rays

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Huang, C. C. ; Hewak, D. W. ; Badding, John V. / Deposition and characterization of germanium sulphide glass planar waveguides. In: Optics Express. 2004 ; Vol. 12, No. 11. pp. 2501-2506.
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Deposition and characterization of germanium sulphide glass planar waveguides. / Huang, C. C.; Hewak, D. W.; Badding, John V.

In: Optics Express, Vol. 12, No. 11, 31.05.2004, p. 2501-2506.

Research output: Contribution to journalArticle

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