Deposition kinetics on particles in a dusty plasma reactor

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

We report on the use of dusty plasma chemical vapor deposition for the coating of micron and submicron sized particles. Particles are introduced into a capacitively coupled low-pressure plasma where they become charged and remain electrostatically confined over extended periods of time. Introduction of a hydrocarbon in the plasma results in the formation of a cross-linked solid (plasma polymer) which deposits on the particle surface in the form of a film. The thickness of the coating varies from 3 nm to more than several hundred nanometers and is found to be a linear function of time. The size distribution and the uniformity of deposition are studied as a function of the deposition time and particle size and the results are interpreted qualitatively via a surface deposition model.

Original languageEnglish (US)
Pages (from-to)2916-2922
Number of pages7
JournalJournal of Applied Physics
Volume92
Issue number5
DOIs
StatePublished - Sep 1 2002

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dusty plasmas
reactors
kinetics
coatings
low pressure
hydrocarbons
deposits
vapor deposition
polymers

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

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Deposition kinetics on particles in a dusty plasma reactor. / Cao, Jin; Matsoukas, Themis.

In: Journal of Applied Physics, Vol. 92, No. 5, 01.09.2002, p. 2916-2922.

Research output: Contribution to journalArticle

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