Deposition of diamond from alcohol precursors in an electron cyclotron resonance plasma system

Donald R. Gilbert, Melanie L. Carasso, Paul A. Demkowicz, Rajiv K. Singh, James H. Adair

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

Microstructural control is a critical issue in the use of diamond films in a variety of engineering applications. Using a novel, electrostatic-based particle seeding process, we have investigated the deposition of diamond films with varying areal nucleation densities. Depositions were performed at low pressures (1.000 and 1.500 Torr) in a modified electron cyclotron resonance plasma system. Methyl alcohol was the primary diamond precursor species. Scanning electron microscopy and Raman spectroscopy were used to evaluate microstructure and composition characteristics. Comparisons in deposition characteristics were made based on relative nucleation density and gas-phase composition.

Original languageEnglish (US)
Pages (from-to)1326-1330
Number of pages5
JournalJournal of Electronic Materials
Volume26
Issue number11
DOIs
StatePublished - Nov 1997

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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