Deposition of stable hydrophobic coatings with in-line CH4 atmospheric rf plasma

Jeong Hoon Kim, Guangming Liu, Seong H. Kim

Research output: Contribution to journalArticle

50 Scopus citations

Abstract

A CH4 atmospheric rf plasma treatment process was demonstrated for hydrophobic treatments of various substrates including metallic and insulating surfaces as well as flat and rough surfaces. A stable rf glow plasma was generated over a 1 cm × 16 cm area using a cylindrical electrode geometry. A typical hydrophobic treatment speed was 5-10 cm min-1. CH4 plasma polymerization deposited a very smooth hydrocarbon layer composed of CH2 and CH3 groups. The inclusion of oxygenated species was less than 1%. On flat substrates, the water contact angle was ∼90°. On rough surfaces such as cotton, the contact angle reached up to 150°. Since this method does not require vacuum or any special venting systems, it will be suitable for in-line processing of a wide range of substrate materials.

Original languageEnglish (US)
Pages (from-to)977-981
Number of pages5
JournalJournal of Materials Chemistry
Volume16
Issue number10
DOIs
StatePublished - Mar 8 2006

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

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