Design and fabrication of adjustable X-ray optics using piezoelectric thin films

J. Walker, T. Liu, M. Tendulkar, David Nelson Burrows, C. T. Deroo, R. Allured, E. Hertz, V. Cotroneo, P. Reid, E. D. Schwartz, Thomas Nelson Jackson, Susan E. Trolier-McKinstry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

Piezoelectric adjustable optics are being developed for high throughput, high resolution, low mass Xray mirror assemblies. These optics require robust piezoelectric thin films and reproducible lithographic patterning on curved glass substrates. This work details the cleaning of Corning Eagle XG glass substrates for thin shell X-ray mirrors by a three stage acid and solvent cleaning procedure before a 0.02 μm Ti adhesion layer and a 0.1 μm Pt bottom electrode layer was deposited using DC magnetron sputtering. Piezoelectric Pb(Zr0.52Ti0.48)0.99Nb0.01O3 thin films with a thickness of 1.5 μm were then deposited by radio frequency magnetron sputtering in three 0.5 μm layers with intermittent annealing steps in a rapid thermal annealing furnace at 650°C for 60 seconds. Defects observed in the piezoelectric thin films were linked to residue remaining on the glass after cleaning. 112 piezoelectric cells and 100 μm wide conductive Pt traces were patterned using bilayer photolithography. The photoresist layers were deposited using spin coating at 2000 and 4000 RPM to achieve uniform 1 μm thick layers, resulting in reproducibly resolved features with limiting resolutions of approximately >25 μm. The resulting mirror pieces achieved a 100% yield, with average relative permittivity of 1270, dielectric loss 0.047, coercive field 30 kV/cm and remanent polarization of 20 μC/cm2. While the defects observed in the films appeared to have not influence on the electrical properties, additional cleaning steps using Di water were proposed to further reduce their presence.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
EditorsStephen L. O'Dell, Giovanni Pareschi
PublisherSPIE
ISBN (Electronic)9781510612556
DOIs
StatePublished - Jan 1 2017
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy VIII 2017 - San Diego, United States
Duration: Aug 8 2017Aug 10 2017

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10399
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptics for EUV, X-Ray, and Gamma-Ray Astronomy VIII 2017
CountryUnited States
CitySan Diego
Period8/8/178/10/17

Fingerprint

X ray optics
X-ray Optics
geometrical optics
Cleaning
Thin Films
Fabrication
cleaning
Thin films
fabrication
thin films
Magnetron Sputtering
Glass
Magnetron sputtering
Optics
mirrors
Mirrors
x rays
Annealing
glass
Mirror

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Walker, J., Liu, T., Tendulkar, M., Burrows, D. N., Deroo, C. T., Allured, R., ... Trolier-McKinstry, S. E. (2017). Design and fabrication of adjustable X-ray optics using piezoelectric thin films. In S. L. O'Dell, & G. Pareschi (Eds.), Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII [103991K] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10399). SPIE. https://doi.org/10.1117/12.2275351
Walker, J. ; Liu, T. ; Tendulkar, M. ; Burrows, David Nelson ; Deroo, C. T. ; Allured, R. ; Hertz, E. ; Cotroneo, V. ; Reid, P. ; Schwartz, E. D. ; Jackson, Thomas Nelson ; Trolier-McKinstry, Susan E. / Design and fabrication of adjustable X-ray optics using piezoelectric thin films. Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII. editor / Stephen L. O'Dell ; Giovanni Pareschi. SPIE, 2017. (Proceedings of SPIE - The International Society for Optical Engineering).
@inproceedings{ab7ac86b3aef498dbff66b2ed7a6fc94,
title = "Design and fabrication of adjustable X-ray optics using piezoelectric thin films",
abstract = "Piezoelectric adjustable optics are being developed for high throughput, high resolution, low mass Xray mirror assemblies. These optics require robust piezoelectric thin films and reproducible lithographic patterning on curved glass substrates. This work details the cleaning of Corning Eagle XG glass substrates for thin shell X-ray mirrors by a three stage acid and solvent cleaning procedure before a 0.02 μm Ti adhesion layer and a 0.1 μm Pt bottom electrode layer was deposited using DC magnetron sputtering. Piezoelectric Pb(Zr0.52Ti0.48)0.99Nb0.01O3 thin films with a thickness of 1.5 μm were then deposited by radio frequency magnetron sputtering in three 0.5 μm layers with intermittent annealing steps in a rapid thermal annealing furnace at 650°C for 60 seconds. Defects observed in the piezoelectric thin films were linked to residue remaining on the glass after cleaning. 112 piezoelectric cells and 100 μm wide conductive Pt traces were patterned using bilayer photolithography. The photoresist layers were deposited using spin coating at 2000 and 4000 RPM to achieve uniform 1 μm thick layers, resulting in reproducibly resolved features with limiting resolutions of approximately >25 μm. The resulting mirror pieces achieved a 100{\%} yield, with average relative permittivity of 1270, dielectric loss 0.047, coercive field 30 kV/cm and remanent polarization of 20 μC/cm2. While the defects observed in the films appeared to have not influence on the electrical properties, additional cleaning steps using Di water were proposed to further reduce their presence.",
author = "J. Walker and T. Liu and M. Tendulkar and Burrows, {David Nelson} and Deroo, {C. T.} and R. Allured and E. Hertz and V. Cotroneo and P. Reid and Schwartz, {E. D.} and Jackson, {Thomas Nelson} and Trolier-McKinstry, {Susan E.}",
year = "2017",
month = "1",
day = "1",
doi = "10.1117/12.2275351",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "O'Dell, {Stephen L.} and Giovanni Pareschi",
booktitle = "Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII",
address = "United States",

}

Walker, J, Liu, T, Tendulkar, M, Burrows, DN, Deroo, CT, Allured, R, Hertz, E, Cotroneo, V, Reid, P, Schwartz, ED, Jackson, TN & Trolier-McKinstry, SE 2017, Design and fabrication of adjustable X-ray optics using piezoelectric thin films. in SL O'Dell & G Pareschi (eds), Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII., 103991K, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10399, SPIE, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII 2017, San Diego, United States, 8/8/17. https://doi.org/10.1117/12.2275351

Design and fabrication of adjustable X-ray optics using piezoelectric thin films. / Walker, J.; Liu, T.; Tendulkar, M.; Burrows, David Nelson; Deroo, C. T.; Allured, R.; Hertz, E.; Cotroneo, V.; Reid, P.; Schwartz, E. D.; Jackson, Thomas Nelson; Trolier-McKinstry, Susan E.

Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII. ed. / Stephen L. O'Dell; Giovanni Pareschi. SPIE, 2017. 103991K (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10399).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Design and fabrication of adjustable X-ray optics using piezoelectric thin films

AU - Walker, J.

AU - Liu, T.

AU - Tendulkar, M.

AU - Burrows, David Nelson

AU - Deroo, C. T.

AU - Allured, R.

AU - Hertz, E.

AU - Cotroneo, V.

AU - Reid, P.

AU - Schwartz, E. D.

AU - Jackson, Thomas Nelson

AU - Trolier-McKinstry, Susan E.

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Piezoelectric adjustable optics are being developed for high throughput, high resolution, low mass Xray mirror assemblies. These optics require robust piezoelectric thin films and reproducible lithographic patterning on curved glass substrates. This work details the cleaning of Corning Eagle XG glass substrates for thin shell X-ray mirrors by a three stage acid and solvent cleaning procedure before a 0.02 μm Ti adhesion layer and a 0.1 μm Pt bottom electrode layer was deposited using DC magnetron sputtering. Piezoelectric Pb(Zr0.52Ti0.48)0.99Nb0.01O3 thin films with a thickness of 1.5 μm were then deposited by radio frequency magnetron sputtering in three 0.5 μm layers with intermittent annealing steps in a rapid thermal annealing furnace at 650°C for 60 seconds. Defects observed in the piezoelectric thin films were linked to residue remaining on the glass after cleaning. 112 piezoelectric cells and 100 μm wide conductive Pt traces were patterned using bilayer photolithography. The photoresist layers were deposited using spin coating at 2000 and 4000 RPM to achieve uniform 1 μm thick layers, resulting in reproducibly resolved features with limiting resolutions of approximately >25 μm. The resulting mirror pieces achieved a 100% yield, with average relative permittivity of 1270, dielectric loss 0.047, coercive field 30 kV/cm and remanent polarization of 20 μC/cm2. While the defects observed in the films appeared to have not influence on the electrical properties, additional cleaning steps using Di water were proposed to further reduce their presence.

AB - Piezoelectric adjustable optics are being developed for high throughput, high resolution, low mass Xray mirror assemblies. These optics require robust piezoelectric thin films and reproducible lithographic patterning on curved glass substrates. This work details the cleaning of Corning Eagle XG glass substrates for thin shell X-ray mirrors by a three stage acid and solvent cleaning procedure before a 0.02 μm Ti adhesion layer and a 0.1 μm Pt bottom electrode layer was deposited using DC magnetron sputtering. Piezoelectric Pb(Zr0.52Ti0.48)0.99Nb0.01O3 thin films with a thickness of 1.5 μm were then deposited by radio frequency magnetron sputtering in three 0.5 μm layers with intermittent annealing steps in a rapid thermal annealing furnace at 650°C for 60 seconds. Defects observed in the piezoelectric thin films were linked to residue remaining on the glass after cleaning. 112 piezoelectric cells and 100 μm wide conductive Pt traces were patterned using bilayer photolithography. The photoresist layers were deposited using spin coating at 2000 and 4000 RPM to achieve uniform 1 μm thick layers, resulting in reproducibly resolved features with limiting resolutions of approximately >25 μm. The resulting mirror pieces achieved a 100% yield, with average relative permittivity of 1270, dielectric loss 0.047, coercive field 30 kV/cm and remanent polarization of 20 μC/cm2. While the defects observed in the films appeared to have not influence on the electrical properties, additional cleaning steps using Di water were proposed to further reduce their presence.

UR - http://www.scopus.com/inward/record.url?scp=85033437784&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85033437784&partnerID=8YFLogxK

U2 - 10.1117/12.2275351

DO - 10.1117/12.2275351

M3 - Conference contribution

AN - SCOPUS:85033437784

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII

A2 - O'Dell, Stephen L.

A2 - Pareschi, Giovanni

PB - SPIE

ER -

Walker J, Liu T, Tendulkar M, Burrows DN, Deroo CT, Allured R et al. Design and fabrication of adjustable X-ray optics using piezoelectric thin films. In O'Dell SL, Pareschi G, editors, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII. SPIE. 2017. 103991K. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2275351