Design of a phase-shifted long-period grating using the partial-etching technique

Kun Wook Chung, Shizhuo Yin

    Research output: Contribution to journalArticlepeer-review

    15 Scopus citations

    Abstract

    In this paper, a newly designed reconfigurable phase-shifted long period grating using the partial etching technique is presented. In the locally etched long-period grating, there are discontinuities in the effective refractive index of the cladding modes. The phase shift in the long-period grating is generated due to the effective-refractive-index change of the cladding modes in the locally etched long-period grating. The phase shift is proportional to the partial etching depth and etching length. Thus, by controlling the etching depth and the etching area, we can tune the transmission spectrum of a long period grating after it has been written and create an arbitrary spectral response of the grating. Using this characteristic, we design a reconfigurable phase-shifted long-period grating. The phase-shifted long-period grating introduced in this paper will be used in a reconfigurable gain-flattening filter for optical amplifiers, such as the erbium-doped fiber amplifier (EDFA). We believe that this post-processing partial-etching technique can eliminate the complicated fabrication process in order to make a complex grating mask for a gain-flattening filter, thus simplifying the fabrication process and reducing manufacturing cost.

    Original languageEnglish (US)
    Pages (from-to)18-21
    Number of pages4
    JournalMicrowave and Optical Technology Letters
    Volume45
    Issue number1
    DOIs
    StatePublished - Apr 5 2005

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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