Desorption - Ionization mass spectrometry using deposited nanostructured silicon films

J. D. Cuiffi, D. J. Hayes, S. J. Fonash, K. N. Brown, A. D. Jones

Research output: Contribution to journalArticle

87 Citations (Scopus)

Abstract

We present a method for desorption ionization on silicon based on novel column/void-network-deposited silicon thin films. A number of different peptides and proteins in the ≤6000 Daltons range are analyzed by time-of-flight mass spectrometry in this demonstration of our approach. A variety of sample preparation conditions, including the use of chemical additives, surface treatments, and sample purification are used to show the potential of mass analysis using deposited column/void-network silicon films for high throughput proteomic screening.

Original languageEnglish (US)
Pages (from-to)1292-1295
Number of pages4
JournalAnalytical chemistry
Volume73
Issue number6
DOIs
StatePublished - Mar 15 2001

Fingerprint

Silicon
Ionization
Mass spectrometry
Desorption
Purification
Surface treatment
Screening
Demonstrations
Throughput
Thin films
Peptides
Proteins

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry

Cite this

Cuiffi, J. D. ; Hayes, D. J. ; Fonash, S. J. ; Brown, K. N. ; Jones, A. D. / Desorption - Ionization mass spectrometry using deposited nanostructured silicon films. In: Analytical chemistry. 2001 ; Vol. 73, No. 6. pp. 1292-1295.
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Desorption - Ionization mass spectrometry using deposited nanostructured silicon films. / Cuiffi, J. D.; Hayes, D. J.; Fonash, S. J.; Brown, K. N.; Jones, A. D.

In: Analytical chemistry, Vol. 73, No. 6, 15.03.2001, p. 1292-1295.

Research output: Contribution to journalArticle

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