Detection of high mass cluster ions sputtered from Bi surfaces

A. Shepard, R. W. Hewitt, G. J. Slusser, W. E. Baitinger, R. G. Cooks, N. Winograd, W. N. Delgass, A. Varon, G. Devant

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

The technique of secondary ion mass spectrometry (SIMS) has been employed to detect Bi+3 ions and associated oxides Bi3O+x (x ≈ 1 to 4) from a Bi foil. Using a 3 keV Ar+ ion primary beam of 5 × 10-7 A/cm2, mass resolution to nearly 700 with the requisite sensitivity has been achieved. The Bi surface was also monitored by X-ray photoelectron spectroscopy (XPS or ESCA). The presence of a weak O 1s peak at 532.7 eV and a strong SIMS Bi+3 peak is interpreted to mean that the oxygen is weakly incorporated into the Bi lattice without disrupting metalmetal bonds.

Original languageEnglish (US)
Pages (from-to)371-373
Number of pages3
JournalChemical Physics Letters
Volume44
Issue number2
DOIs
StatePublished - Dec 1 1976

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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