Engineering & Materials Science
Zirconia
83%
Thin films
66%
Relaxation
65%
Dielectric losses
59%
Capacitors
55%
Annealing
46%
Dielectric films
34%
Magnetron sputtering
31%
Electric space charge
31%
Charge transfer
30%
Oxide films
29%
Thick films
28%
Crystallinity
28%
Temperature
28%
Spectroscopy
26%
Gold
25%
Crystalline materials
24%
Activation energy
24%
Electric fields
21%
Oxides
20%
Electrodes
17%
Acoustic impedance
17%
Physics & Astronomy
MIM (semiconductors)
100%
zirconium oxides
71%
capacitors
61%
flux density
56%
conductivity
46%
direct current
41%
thin films
36%
dielectric loss
33%
alternating current
31%
extremely low frequencies
23%
annealing
21%
amorphous materials
20%
thick films
16%
crystallinity
15%
space charge
15%
magnetron sputtering
14%
gold
13%
impedance
13%
activation energy
12%
oxides
10%
electrodes
10%
electric fields
10%
room temperature
9%
spectroscopy
9%
temperature
5%
Chemical Compounds
Capacitor
72%
Conductivity
46%
Dielectric Loss
40%
Energy
33%
Annealing
27%
Relaxation Frequency
27%
Dielectric Film
25%
Liquid Film
25%
Space Charge
22%
Magnetron Sputtering
20%
Electric Field
15%
Impedance Spectroscopy
13%
Crystallinity
13%
Charge Transfer
12%
Reaction Activation Energy
12%
Amorphous Material
12%
Ambient Reaction Temperature
9%
Oxide
9%
Behavior as Electrode
8%