Dielectric and microstructural properties of barium titanate hafnate thin films

Jon F. Ihlefeld, William J. Borland, Jon-Paul Maria

Research output: Contribution to journalArticle

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Abstract

Barium titanate hafnate (BaTi1-xHfxO3, 0 ≤ x ≤ 0.25) thin films have been deposited by a chemical solution method on copper foil substrates. The films were crystallized at 900 °C and in a reducing atmosphere to prevent substrate oxidation. Perovskite phase formation was identified for each composition, accompanied by an increased pseudocubic lattice parameter. Temperature dependent dielectric measurements revealed a decreasing phase transition temperature and peak permittivity with increasing hafnium level. The decrease in permittivity resulted from grain size reduction with increasing hafnium content. Compositions containing 25 mol% barium hafnate display a deviation from Curie-Weiss behavior indicating the onset of relaxor behavior.

Original languageEnglish (US)
Pages (from-to)3162-3166
Number of pages5
JournalThin Solid Films
Volume516
Issue number10
DOIs
StatePublished - Mar 31 2008

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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