Dielectric behavior of bilayer films of P(VDF-CTFE) and low temperature PECVD fabricated Si3N4

Xin Zhou, Qin Chen, Qiming Zhang, Shihai Zhang

    Research output: Contribution to journalArticle

    11 Scopus citations

    Abstract

    We report the investigation of a bilayer approach to reduce the loss, especially the conduction loss at high electric fields, in the poly(vinylidene fluoride - chlorotrifluoroethylene) P(VDF-CTFE) films which exhibit high discharged energy density. There are many challenges for another dielectric layer used in the bilayer to block the conduction loss, including not only low dielectric loss and high resistivity, but also matched dielectric constant to and compatible film fabrication condition with the P(VDF-CTFE) films. We show that Si3N4 films, which can be synthesized by the plasma enhanced chemical vapor deposition (PECVD) at 100°C and thus will not cause damage to the P(VDF-CTFE) films, can meet these challenges. Experimental results show that with a proper low temperature PECVD deposition, the Si 3N4 films display a dielectric constant ∼ 7 with a low dielectric loss (> 700 MV/m). Consequently, the bilayer films of Si 3N4/P(VDF-CTFE) exhibit a high energy density (> 10 J/cm3 at fields higher than 435 MV/m) with significantly reduced losses.

    Original languageEnglish (US)
    Article number5739450
    Pages (from-to)463-470
    Number of pages8
    JournalIEEE Transactions on Dielectrics and Electrical Insulation
    Volume18
    Issue number2
    DOIs
    StatePublished - Apr 1 2011

    All Science Journal Classification (ASJC) codes

    • Electrical and Electronic Engineering

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