Dielectric Properties of Microporous Glass in the Microwave Region

Joyce K. Yamamoto, Michael T. Lanagan, Amar S. Bhalla, Robert E. Newnham, L. Eric Cross

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The dielectric properties of a high‐silica microporous glass were determined at 5.5 and 11.4 GHz. Two measurement methods were used to measure these properties, the resonant cavity and resonant post (Hakki–Coleman) techniques. The accuracy of the two measurement techniques was evaluated and the limiting conditions of measurement were determined. The glass, consisting of pore sizes on the order of tens of angstroms, was subjected to thermal treatments in an oxidizing atmosphere at temperatures from 300° to 1100°C, and chemical treatments in 2% and 10% HF for varying amounts of time. Heat treatment of the glass at 800°C produced a minimum dielectric constant of 2.8 and loss of 0.001. The acid treatment had little effect on the dielectric properties.

Original languageEnglish (US)
Pages (from-to)916-921
Number of pages6
JournalJournal of the American Ceramic Society
Volume72
Issue number6
DOIs
StatePublished - Jan 1 1989

Fingerprint

Dielectric properties
Microwaves
Glass
Heat treatment
Cavity resonators
Pore size
Permittivity
Acids
Temperature

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

Cite this

Yamamoto, Joyce K. ; Lanagan, Michael T. ; Bhalla, Amar S. ; Newnham, Robert E. ; Cross, L. Eric. / Dielectric Properties of Microporous Glass in the Microwave Region. In: Journal of the American Ceramic Society. 1989 ; Vol. 72, No. 6. pp. 916-921.
@article{3cf1d541b6ea4d9d926a25502b48f618,
title = "Dielectric Properties of Microporous Glass in the Microwave Region",
abstract = "The dielectric properties of a high‐silica microporous glass were determined at 5.5 and 11.4 GHz. Two measurement methods were used to measure these properties, the resonant cavity and resonant post (Hakki–Coleman) techniques. The accuracy of the two measurement techniques was evaluated and the limiting conditions of measurement were determined. The glass, consisting of pore sizes on the order of tens of angstroms, was subjected to thermal treatments in an oxidizing atmosphere at temperatures from 300° to 1100°C, and chemical treatments in 2{\%} and 10{\%} HF for varying amounts of time. Heat treatment of the glass at 800°C produced a minimum dielectric constant of 2.8 and loss of 0.001. The acid treatment had little effect on the dielectric properties.",
author = "Yamamoto, {Joyce K.} and Lanagan, {Michael T.} and Bhalla, {Amar S.} and Newnham, {Robert E.} and Cross, {L. Eric}",
year = "1989",
month = "1",
day = "1",
doi = "10.1111/j.1151-2916.1989.tb06244.x",
language = "English (US)",
volume = "72",
pages = "916--921",
journal = "Journal of the American Ceramic Society",
issn = "0002-7820",
publisher = "Wiley-Blackwell",
number = "6",

}

Dielectric Properties of Microporous Glass in the Microwave Region. / Yamamoto, Joyce K.; Lanagan, Michael T.; Bhalla, Amar S.; Newnham, Robert E.; Cross, L. Eric.

In: Journal of the American Ceramic Society, Vol. 72, No. 6, 01.01.1989, p. 916-921.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Dielectric Properties of Microporous Glass in the Microwave Region

AU - Yamamoto, Joyce K.

AU - Lanagan, Michael T.

AU - Bhalla, Amar S.

AU - Newnham, Robert E.

AU - Cross, L. Eric

PY - 1989/1/1

Y1 - 1989/1/1

N2 - The dielectric properties of a high‐silica microporous glass were determined at 5.5 and 11.4 GHz. Two measurement methods were used to measure these properties, the resonant cavity and resonant post (Hakki–Coleman) techniques. The accuracy of the two measurement techniques was evaluated and the limiting conditions of measurement were determined. The glass, consisting of pore sizes on the order of tens of angstroms, was subjected to thermal treatments in an oxidizing atmosphere at temperatures from 300° to 1100°C, and chemical treatments in 2% and 10% HF for varying amounts of time. Heat treatment of the glass at 800°C produced a minimum dielectric constant of 2.8 and loss of 0.001. The acid treatment had little effect on the dielectric properties.

AB - The dielectric properties of a high‐silica microporous glass were determined at 5.5 and 11.4 GHz. Two measurement methods were used to measure these properties, the resonant cavity and resonant post (Hakki–Coleman) techniques. The accuracy of the two measurement techniques was evaluated and the limiting conditions of measurement were determined. The glass, consisting of pore sizes on the order of tens of angstroms, was subjected to thermal treatments in an oxidizing atmosphere at temperatures from 300° to 1100°C, and chemical treatments in 2% and 10% HF for varying amounts of time. Heat treatment of the glass at 800°C produced a minimum dielectric constant of 2.8 and loss of 0.001. The acid treatment had little effect on the dielectric properties.

UR - http://www.scopus.com/inward/record.url?scp=0024680633&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0024680633&partnerID=8YFLogxK

U2 - 10.1111/j.1151-2916.1989.tb06244.x

DO - 10.1111/j.1151-2916.1989.tb06244.x

M3 - Article

VL - 72

SP - 916

EP - 921

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

SN - 0002-7820

IS - 6

ER -