The dielectric properties of a high‐silica microporous glass were determined at 5.5 and 11.4 GHz. Two measurement methods were used to measure these properties, the resonant cavity and resonant post (Hakki–Coleman) techniques. The accuracy of the two measurement techniques was evaluated and the limiting conditions of measurement were determined. The glass, consisting of pore sizes on the order of tens of angstroms, was subjected to thermal treatments in an oxidizing atmosphere at temperatures from 300° to 1100°C, and chemical treatments in 2% and 10% HF for varying amounts of time. Heat treatment of the glass at 800°C produced a minimum dielectric constant of 2.8 and loss of 0.001. The acid treatment had little effect on the dielectric properties.
|Original language||English (US)|
|Number of pages||6|
|Journal||Journal of the American Ceramic Society|
|State||Published - Jun 1989|
All Science Journal Classification (ASJC) codes
- Ceramics and Composites
- Materials Chemistry