Direct fabrication of two-dimensional titania arrays using interference photolithography

Atsushi Shishido, Ivan B. Diviliansky, I. C. Khoo, Theresa S. Mayer, Suzushi Nishimura, Gina L. Egan, Thomas E. Mallouk

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Two-dimensional (2D) titania arrays with periods of 0.8-2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium-aluminum-garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.

Original languageEnglish (US)
Pages (from-to)3332-3334
Number of pages3
JournalApplied Physics Letters
Issue number20
StatePublished - Nov 12 2001


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Shishido, A., Diviliansky, I. B., Khoo, I. C., Mayer, T. S., Nishimura, S., Egan, G. L., & Mallouk, T. E. (2001). Direct fabrication of two-dimensional titania arrays using interference photolithography. Applied Physics Letters, 79(20), 3332-3334.