Direct measurement of the in situ developed latent image: The residual swelling fraction

Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, Sushil K. Satija, Karen Turnquest

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations


The spatial distribution of polymer photoresist and deuterium labeled developer highlights a fraction of material at a model line edge that swells, but does not dissolve. This residual swelling fraction remains swollen during both the in situ development and rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. We demonstrate that contrast variant neutron reflectivity provides a general method to probe the nanometer resolved in situ development and rinse process step.

Original languageEnglish (US)
Title of host publicationAdvances in Resist Materials and Processing Technology XXIV
EditionPART 1
StatePublished - 2007
EventAdvances in Resist Materials and Processing Technology XXIV - San Jose, CA, United States
Duration: Feb 26 2007Feb 28 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
NumberPART 1
ISSN (Print)0277-786X


ConferenceAdvances in Resist Materials and Processing Technology XXIV
Country/TerritoryUnited States
CitySan Jose, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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